发明申请
- 专利标题： IMAGING OPTICS AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICS
- 专利标题（中）： 成像光学和投影曝光安装用于成像光学的微观算法
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申请号： US13236873申请日： 2011-09-20
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公开(公告)号： US20120069315A1公开(公告)日： 2012-03-22
- 发明人: Hans-Juergen Mann , Johannes Zellner , Aurelian Dodoc , Claus Zahlten , Christoph Menke , Marco Pretorius , Wilhelm Ulrich , Hans-Juergen Rostalski
- 申请人： Hans-Juergen Mann , Johannes Zellner , Aurelian Dodoc , Claus Zahlten , Christoph Menke , Marco Pretorius , Wilhelm Ulrich , Hans-Juergen Rostalski
- 申请人地址： DE Oberkochen
- 专利权人： CARL ZEISS SMT GMBH
- 当前专利权人： CARL ZEISS SMT GMBH
- 当前专利权人地址： DE Oberkochen
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03B27/70 ; G02B17/06
摘要：
Imaging optics includes a first mirror in the imaging beam path after the object field, a last mirror in the imaging beam path before the image field, and a fourth to last mirror in the imaging beam path before the image field. In an unfolded imaging beam path between the object plane and the image plane, an impingement point of the chief ray on a used region of each of the plurality of mirrors has a mirror spacing from the image plane. The mirror spacing of the first mirror is greater than the mirror spacing of the last mirror. The mirror spacing of the fourth to last mirror is greater than the mirror spacing of the first mirror. Chief rays that emanate from points of the object field that are spaced apart from another have a mutually diverging beam course, giving a negative back focus of the entrance pupil.