Imaging optics and projection exposure installation for microlithography with an imaging optics
    1.
    发明授权
    Imaging optics and projection exposure installation for microlithography with an imaging optics 有权
    用于具有成像光学元件的微光刻的成像光学和投影曝光安装

    公开(公告)号:US09057964B2

    公开(公告)日:2015-06-16

    申请号:US13236873

    申请日:2011-09-20

    IPC分类号: G02B17/06 G03F7/20 G02B17/08

    摘要: Imaging optics includes a first mirror in the imaging beam path after the object field, a last mirror in the imaging beam path before the image field, and a fourth to last mirror in the imaging beam path before the image field. In an unfolded imaging beam path between the object plane and the image plane, an impingement point of the chief ray on a used region of each of the plurality of mirrors has a mirror spacing from the image plane. The mirror spacing of the first mirror is greater than the mirror spacing of the last mirror. The mirror spacing of the fourth to last mirror is greater than the mirror spacing of the first mirror. Chief rays that emanate from points of the object field that are spaced apart from another have a mutually diverging beam course, giving a negative back focus of the entrance pupil.

    摘要翻译: 成像光学器件包括在物场之后的成像光束路径中的第一反射镜,在图像场之前的成像光束路径中的最后一个反射镜,以及在图像场之前的成像光束路径中的第四个至最后一个镜像。 在物平面和图像平面之间的展开成像光束路径中,多个反射镜中的每一个的使用区域上的主光线的冲击点具有与图像平面相反的反射镜间隔。 第一个镜子的镜子间距大于最后一个镜子的反射镜间距。 第四到最后一个镜子的镜子间距大于第一个镜子的镜子间距。 从与物体间隔开的物体点发出的主光线具有相互发散的光束路线,给入射光瞳的负后焦距。

    IMAGING OPTICS AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICS
    2.
    发明申请
    IMAGING OPTICS AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICS 有权
    成像光学和投影曝光安装用于成像光学的微观算法

    公开(公告)号:US20120069315A1

    公开(公告)日:2012-03-22

    申请号:US13236873

    申请日:2011-09-20

    IPC分类号: G03F7/20 G03B27/70 G02B17/06

    摘要: Imaging optics includes a first mirror in the imaging beam path after the object field, a last mirror in the imaging beam path before the image field, and a fourth to last mirror in the imaging beam path before the image field. In an unfolded imaging beam path between the object plane and the image plane, an impingement point of the chief ray on a used region of each of the plurality of mirrors has a mirror spacing from the image plane. The mirror spacing of the first mirror is greater than the mirror spacing of the last mirror. The mirror spacing of the fourth to last mirror is greater than the mirror spacing of the first mirror. Chief rays that emanate from points of the object field that are spaced apart from another have a mutually diverging beam course, giving a negative back focus of the entrance pupil.

    摘要翻译: 成像光学器件包括在物场之后的成像光束路径中的第一反射镜,在图像场之前的成像光束路径中的最后一个反射镜,以及在图像场之前的成像光束路径中的第四个至最后一个镜像。 在物平面和图像平面之间的展开成像光束路径中,多个反射镜中的每一个的使用区域上的主光线的冲击点具有与图像平面相反的反射镜间隔。 第一个镜子的镜子间距大于最后一个镜子的反射镜间距。 第四到最后一个镜子的镜子间距大于第一个镜子的镜子间距。 从与物体间隔开的物体点发出的主光线具有相互发散的光束路线,给入射光瞳的负后焦距。