Invention Application
- Patent Title: Methods of Forming Diodes
- Patent Title (中): 形成二极管的方法
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Application No.: US13305072Application Date: 2011-11-28
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Publication No.: US20120070973A1Publication Date: 2012-03-22
- Inventor: Gurtej S. Sandhu , Bhaskar Srinivasan
- Applicant: Gurtej S. Sandhu , Bhaskar Srinivasan
- Applicant Address: US ID Boise
- Assignee: MICRON TECHNOLOGY, INC.
- Current Assignee: MICRON TECHNOLOGY, INC.
- Current Assignee Address: US ID Boise
- Main IPC: H01L21/04
- IPC: H01L21/04

Abstract:
Some embodiments include methods of forming diodes. A stack may be formed over a first conductive material. The stack may include, in ascending order, a sacrificial material, at least one dielectric material, and a second conductive material. Spacers may be formed along opposing sidewalls of the stack, and then an entirety of the sacrificial material may be removed to leave a gap between the first conductive material and the at least one dielectric material. In some embodiments of forming diodes, a layer may be formed over a first conductive material, with the layer containing supports interspersed in sacrificial material. At least one dielectric material may be formed over the layer, and a second conductive material may be formed over the at least one dielectric material. An entirety of the sacrificial material may then be removed.
Public/Granted literature
- US08343828B2 Methods of forming diodes Public/Granted day:2013-01-01
Information query
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