发明申请
- 专利标题: Integrated Shadow Mask/Carrier for Pattern Ion Implantation
- 专利标题(中): 用于图案离子植入的集成阴影掩模/载体
-
申请号: US12895927申请日: 2010-10-01
-
公开(公告)号: US20120083102A1公开(公告)日: 2012-04-05
- 发明人: Nicholas Bateman , Kevin Daniels , Atul Gupta , Russell Low , Benjamin Riordon , Robert Mitchell , Steven Anella
- 申请人: Nicholas Bateman , Kevin Daniels , Atul Gupta , Russell Low , Benjamin Riordon , Robert Mitchell , Steven Anella
- 申请人地址: US MA Gloucester
- 专利权人: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
- 当前专利权人: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
- 当前专利权人地址: US MA Gloucester
- 主分类号: H01L21/71
- IPC分类号: H01L21/71 ; H01J37/20
摘要:
An improved, lower cost method of processing substrates, such as to create solar cells is disclosed. In addition, a modified substrate carrier is disclosed. The carriers typically used to carry the substrates are modified so as to serve as shadow masks for a patterned implant. In some embodiments, various patterns can be created using the carriers such that different process steps can be performed on the substrate by changing the carrier or the position with the carrier. In addition, since the alignment of the substrate to the carrier is critical, the carrier may contain alignment features to insure that the substrate is positioned properly on the carrier. In some embodiments, gravity is used to hold the substrate on the carrier, and therefore, the ions are directed so that the ion beam travels upward toward the bottom side of the carrier.
公开/授权文献
信息查询
IPC分类: