发明申请
- 专利标题: LIGHT REFLECTING SUBSTRATE AND PROCESS FOR MANUFACTURE THEREOF
- 专利标题(中): 光反射基板及其制造方法
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申请号: US13380779申请日: 2010-06-23
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公开(公告)号: US20120091495A1公开(公告)日: 2012-04-19
- 发明人: Yusuke Hatanaka , Yoshinori Hotta , Akio Uesugi
- 申请人: Yusuke Hatanaka , Yoshinori Hotta , Akio Uesugi
- 申请人地址: JP Minato-ku, Tokyo
- 专利权人: FUJIFILM CORPORATION
- 当前专利权人: FUJIFILM CORPORATION
- 当前专利权人地址: JP Minato-ku, Tokyo
- 优先权: JP2009-152072 20090626; JP2009-178114 20090730; JP2009-289358 20091221; JP2010-010820 20100121; JP2010-046514 20100303
- 国际申请: PCT/JP2010/060629 WO 20100623
- 主分类号: H01L33/60
- IPC分类号: H01L33/60 ; C25D5/44 ; C25D7/00 ; G02B5/08
摘要:
A light reflecting substrate comprises at least: an insulating layer and a metal layer disposed in contact with the insulating layer. The total reflectivity of light in the wavelength range of more than 320 nm and not more than 700 nm is not less than 50% and the total reflectivity of light in the wavelength range of 300 nm to 320 nm is not less than 60%. The light reflecting substrate further improves the emission power of the light-emitting device when used as the substrate therefor.
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