发明申请
- 专利标题： GAS MANIFOLD, MODULE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- 专利标题（中）： 气体放映机，光刻设备模块，光刻设备和器件制造方法
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申请号： US13273817申请日： 2011-10-14
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公开(公告)号： US20120092631A1公开(公告)日： 2012-04-19
- 发明人: Frank Johannes Jacobus VAN BOXTEL , Marinus Johannes Maria Van Dam , Johannes Christiaan Maria Jasper , Ronald Van Der Ham , Sergei Yurievich Shulepov , Gerben Pieterse , Marco Baragona , Pieter Debrauwer , Antonius Arnoldus Henricus Van Der Steen
- 申请人： Frank Johannes Jacobus VAN BOXTEL , Marinus Johannes Maria Van Dam , Johannes Christiaan Maria Jasper , Ronald Van Der Ham , Sergei Yurievich Shulepov , Gerben Pieterse , Marco Baragona , Pieter Debrauwer , Antonius Arnoldus Henricus Van Der Steen
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/52
- IPC分类号： G03B27/52
摘要：
A gas manifold to direct a gas flow between two plates of an optical component of a lithographic apparatus, the gas manifold having an inlet, a diffuser downstream of the inlet, a flow straightener downstream of the inlet, a contractor downstream of the flow straightener, and an outlet downstream of the contractor.