摘要:
A gas manifold to direct a gas flow between two plates of an optical component of a lithographic apparatus, the gas manifold having an inlet, a diffuser downstream of the inlet, a flow straightener downstream of the inlet, a contractor downstream of the flow straightener, and an outlet downstream of the contractor.
摘要:
A gas manifold to direct a gas flow between two plates of an optical component of a lithographic apparatus, the gas manifold having an inlet, a diffuser downstream of the inlet, a flow straightener downstream of the inlet, a contractor downstream of the flow straightener, and an outlet downstream of the contractor.
摘要:
A fluid handling structure, lithographic apparatus and device manufacturing method are disclosed. According to a disclosed embodiment, the fluid handling structure is configured to confine an immersion fluid in a space between a final element of a projection system and a facing surface during movement of the facing surface relative to the structure, wherein the structure has at least one heater to heat a portion of the facing surface adjacent to the heater, the at least one heater having a fluid heater to heat fluid flow from the structure onto the facing surface, the heater thereby heating the portion.
摘要:
A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.
摘要:
A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.
摘要:
A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.
摘要:
A fluid handling structure, lithographic apparatus and device manufacturing method are disclosed. According to a disclosed embodiment, the fluid handling structure is configured to confine an immersion fluid in a space between a final element of a projection system and a facing surface during movement of the facing surface relative to the structure, wherein the structure has at least one heater to heat a portion of the facing surface adjacent to the heater, the at least one heater having a fluid heater to heat fluid flow from the structure onto the facing surface, the heater thereby heating the portion.
摘要:
In one aspect, the invention provides a system and method for spray drying a fluid. The system comprises a fluid reservoir (2), a spraying device (3) that comprises at least one outflow opening (4) for projecting droplets of fluid (5) from the reservoir (2) out of the at least one outflow opening (4) and at least one energy source (6) for at least partially drying the droplets. The spraying device (3) is arranged to project the droplets into a determinable droplet trajectory and the at least one energy source (6) is arranged for providing energy focused substantially on the droplet trajectory. It is an object of the invention to provide a system and method for reducing the amount of energy required for spray drying.
摘要:
An additive fabrication apparatus is provided comprising a movable foil guiding stage (180) having a contact face (181) and comprising on opposite sides of the contact face a pair of upper and lower foil guiding elements (190, 191), the lower foil guiding element (190) defining a foil height position (H0) distanced from the contact face (181), for guiding a foil (6) including a liquid layer (30) to or from the contact face to contact a tangible object (50) by movement of the foil guiding stage along the tangible object while keeping the foil stationary relative to the object (50). An energy source (90) is arranged for at least partially solidifying at least part of an intersection pattern in the liquid layer arranged on the foil and in contact with the tangible object.
摘要:
In one aspect, the invention provides a system and method for spray drying a fluid. The system comprises a fluid reservoir (2), a spraying device (3) that comprises at least one outflow opening (4) for projecting droplets of fluid (5) from the reservoir (2) out of the at least one outflow opening (4) and at least one energy source (6) for at least partially drying the droplets. The spraying device (3) is arranged to project the droplets into a determinable droplet trajectory and the at least one energy source (6) is arranged for providing energy focused substantially on the droplet trajectory. It is an object of the invention to provide a system and method for reducing the amount of energy required for spray drying.