Invention Application
US20120097331A1 GAS FLOW DISTRIBUTION RECEPTACLES, PLASMA GENERATOR SYSTEMS, AND METHODS FOR PERFORMING PLASMA STRIPPING PROCESSES
审中-公开
气体流量分配装置，等离子体发生器系统和执行等离子体剥离方法的方法
- Patent Title: GAS FLOW DISTRIBUTION RECEPTACLES, PLASMA GENERATOR SYSTEMS, AND METHODS FOR PERFORMING PLASMA STRIPPING PROCESSES
- Patent Title (中): 气体流量分配装置，等离子体发生器系统和执行等离子体剥离方法的方法
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Application No.: US13342757Application Date: 2012-01-03
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Publication No.: US20120097331A1Publication Date: 2012-04-26
- Inventor: Huatan Qiu , Woody Chung , Anirban Guha , David Cheung
- Applicant: Huatan Qiu , Woody Chung , Anirban Guha , David Cheung
- Applicant Address: US CA San Jose
- Assignee: NOVELLUS SYSTEMS, INC.
- Current Assignee: NOVELLUS SYSTEMS, INC.
- Current Assignee Address: US CA San Jose
- Main IPC: H01L21/3065
- IPC: H01L21/3065
Abstract:
Systems, system components, and methods for plasma stripping are provided. In an embodiment, a gas flow distribution receptacle may have a rounded section that includes an inner surface defining a reception cavity, an outer surface forming an enclosed end, and a centerpoint on the outer surface having a longitudinal axis extending therethrough and through the reception cavity. First and second rings of openings provide flow communication with the plasma chamber. The second ring of openings are disposed between the first ring and the centerpoint, and each opening of the second ring of openings extends between the inner and outer surfaces at a second angle relative to the longitudinal axis that is less than the first angle and has a diameter that is substantially identical to a diameter of an adjacent opening and smaller than the diameters of an opening of the first ring of openings.
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