发明申请
- 专利标题: METHOD AND SYSTEM FOR PURIFYING SILICON
- 专利标题(中): 用于净化硅的方法和系统
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申请号: US13266631申请日: 2010-04-27
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公开(公告)号: US20120097523A1公开(公告)日: 2012-04-26
- 发明人: Nobuyuki Mori , Hiroshi Yano , Toshiyuki Shiroishi , Takashi Ushida , Nobuhiro Shimizu , Noriyuki Takahashi , Toshihiro Mitsuzuka
- 申请人: Nobuyuki Mori , Hiroshi Yano , Toshiyuki Shiroishi , Takashi Ushida , Nobuhiro Shimizu , Noriyuki Takahashi , Toshihiro Mitsuzuka
- 申请人地址: JP Osaki-shi, Miyagi
- 专利权人: UMK TECHNOLOGIES CO., LTD.
- 当前专利权人: UMK TECHNOLOGIES CO., LTD.
- 当前专利权人地址: JP Osaki-shi, Miyagi
- 优先权: JP2009-108513 20090427
- 国际申请: PCT/JP2010/057511 WO 20100427
- 主分类号: C01B33/037
- IPC分类号: C01B33/037 ; B01J19/08
摘要:
[Objects] To improve productivity and reduce thermal energy consumption in manufacturing of high purity silicon as a raw material for metallurgical grade pure silicon.[Means to Solve]After conducting a first treatment of either removing boron by water-vapor added plasma arc heating or low-pressure oxygen plasma arc heating upon raw silicon contained in a hearth in a chamber to thereby putting the raw silicon into a high temperature molten state to thereby oxidizing and removing boron by evaporation, or removing phosphorus by electron beam irradiation to thereby putting the raw silicon into a high temperature molten state to thereby remove phosphorus by evaporation in an atmosphere suitable to the treatment; the atmosphere of the chamber is then changed to a vacuum atmosphere suitable to the remaining second treatment, while maintaining the silicon contained in the hearth in its molten state, and the second purification treatment is conducted; whereafter end(s) enriched in impurities is cut off by way of one-way coagulation method to obtain a high purity refined silicon ingot highly free from phosphorus, boron and other impurities.
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