发明申请
- 专利标题： MULTILAYERED INFRARED LIGHT REFLECTIVE STRUCTURE
- 专利标题（中）： 多层红外光反射结构
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申请号： US12976897申请日： 2010-12-22
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公开(公告)号： US20120113505A1公开(公告)日： 2012-05-10
- 发明人: Hsiang-Chuan Chen , Mei-Ching Chiang , Chin-Ching Lin , Jen-You Chu , Yi-Ping Chen , Pao-Tang Chung
- 申请人： Hsiang-Chuan Chen , Mei-Ching Chiang , Chin-Ching Lin , Jen-You Chu , Yi-Ping Chen , Pao-Tang Chung
- 申请人地址： TW Hsinchu
- 专利权人： INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- 当前专利权人： INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- 当前专利权人地址： TW Hsinchu
- 优先权： TWTW99138292 20101108
- 主分类号： G02B5/08
- IPC分类号： G02B5/08 ; G02B5/28
摘要：
The invention provides a multilayered infrared light reflective structure. The multilayered infrared light reflective structure includes a transparent substrate. A doped oxide film is disposed on the transparent substrate. An oxide isolated layer is disposed on the doped oxide film, thereby allowing incident light to be incident from a top surface of the transparent substrate into the multilayered infrared light reflective structure.
公开/授权文献
- US08659822B2 Multilayered infrared light reflective structure 公开/授权日：2014-02-25