发明申请
- 专利标题： CONCAVE-CONVEX PATTERN FORMING METHOD AND MAGNETIC TUNNEL JUNCTION ELEMENT FORMING METHOD
- 专利标题（中）： 凹凸图案形成方法和磁性隧道结构元素形成方法
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申请号： US13300062申请日： 2011-11-18
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公开(公告)号： US20120115250A1公开(公告)日： 2012-05-10
- 发明人: Tomotaka Ariga , Yuichi Ohsawa , Junichi Ito , Yoshinari Kurosaki , Saori Kashiwada , Toshiro Hiraoka , Minoru Amano , Satoshi Yanagi
- 申请人： Tomotaka Ariga , Yuichi Ohsawa , Junichi Ito , Yoshinari Kurosaki , Saori Kashiwada , Toshiro Hiraoka , Minoru Amano , Satoshi Yanagi
- 申请人地址： JP Minato-ku
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JP Minato-ku
- 主分类号： H01L21/02
- IPC分类号： H01L21/02 ; H01L21/28
摘要：
A method of forming a concave-convex pattern according to an embodiment includes: forming a guide pattern on a base material, the guide pattern having a convex portion; forming a formative layer on the guide pattern, the formative layer including a stacked structure formed by stacking a first layer and a second layer, the first layer including at least one element selected from a first metal element and a metalloid element, the second layer including a second metal element different from the first metal element; selectively leaving the formative layer only at side faces of the convex portions by performing etching on the formative layer; removing the guide pattern; and forming the concave-convex pattern in the base material by performing etching on the base material, with the remaining formative layer being used as a mask.
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