- 专利标题： LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
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申请号： US13356231申请日： 2012-01-23
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公开(公告)号： US20120120377A1公开(公告)日： 2012-05-17
- 发明人: Christiaan Alexander HOOGENDAM , Erik Roelof Loopstra , Bob Streefkerk , Bernhard Gellrich , Andreas Wurmbrand
- 申请人： Christiaan Alexander HOOGENDAM , Erik Roelof Loopstra , Bob Streefkerk , Bernhard Gellrich , Andreas Wurmbrand
- 申请人地址： DE Oberkochen NL Veldhoven
- 专利权人： CARL ZEISS SMT AG,ASML NETHERLANDS B.V.
- 当前专利权人： CARL ZEISS SMT AG,ASML NETHERLANDS B.V.
- 当前专利权人地址： DE Oberkochen NL Veldhoven
- 优先权： EP03256809.9 20031028
- 主分类号： G03B27/52
- IPC分类号： G03B27/52
摘要：
Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.
公开/授权文献
- US08860922B2 Lithographic apparatus and device manufacturing method 公开/授权日：2014-10-14
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