利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

70 条记录 (耗时 0.025 秒)

    Optical arrangement in a projection exposure apparatus for EUV lithography
    1.
    发明授权
    Optical arrangement in a projection exposure apparatus for EUV lithography 有权
    用于EUV光刻的投影曝光装置中的光学布置

    公开(公告)号：US09298111B2

    公开(公告)日：2016-03-29

    申请号：US13405882

    申请日：2012-02-27

    申请人： Viktor Kulitzki ,  Bernhard Gellrich ,  Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Peter Deufel ,  Andreas Wurmbrand

    发明人： Viktor Kulitzki ,  Bernhard Gellrich ,  Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Peter Deufel ,  Andreas Wurmbrand

    IPC分类号： G03B27/52 ,  G03B27/54 ,  G03B27/32 ,  G03F7/20 ,  G02B7/00

    CPC分类号： G03F7/70916 ,  G02B7/00 ,  G03F7/70233 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70891

    摘要： An optical arrangement includes a multiplicity of optical elements and a carrier structure which carries the optical elements. The carrier structure is composed of at least two releasably interconnected modules. Each module is composed of at least one carrier structure subelement. A subhousing is produced by a multiplicity of carrier structure subelements and/or modules. The subhousing has a geometry that varies, at least in regions, in correspondence to a usable beam path in the projection exposure apparatus, the usable beam path being defined as an envelope of all light bundles which can propagate from all field points in a field plane to an image plane of the projection exposure apparatus. A projection exposure apparatus for EUV lithography includes such an optical arrangement.

    摘要翻译： 光学装置包括多个光学元件和承载光学元件的载体结构。 载体结构由至少两个可释放地互连的模块组成。 每个模块由至少一个载体结构子元件组成。 子载体由多个载体结构子元件和/或模块产生。 子结构具有至少在区域中对应于投影曝光装置中的可用光束路径而变化的几何形状，可用光束路径被定义为可以在场平面中从所有场点传播的所有光束的包络 到投影曝光装置的像平面。 用于EUV光刻的投影曝光装置包括这种光学装置。

    Optical system for microlithography
    4.
    发明授权
    Optical system for microlithography 有权
    光刻系统

    公开(公告)号：US08456616B2

    公开(公告)日：2013-06-04

    申请号：US12993540

    申请日：2009-04-07

    申请人： Daniel Kraehmer ,  Wilhelm Ulrich ,  Matthias Manger ,  Bernhard Gellrich

    发明人： Daniel Kraehmer ,  Wilhelm Ulrich ,  Matthias Manger ,  Bernhard Gellrich

    IPC分类号： G02B3/02 ,  G02B7/02 ,  G03B27/32 ,  G03B27/42 ,  G03B27/54

    CPC分类号： G03F7/70308

    摘要： An optical system, in particular a projection objective, for microlithography, has an optical axis and at least one optical correction arrangement, which has a first optical correction element and at least one second optical correction element, wherein the first correction element is provided with a first aspherical surface contour, and wherein the second correction element is provided with a second aspherical surface contour, wherein the first surface contour and the second surface contour add up at least approximately to zero, wherein the correction arrangement has at least one drive for movement of at least one of the two correction elements. In this case, at least one of the two correction elements can rotate about a rotation axis which is at least approximately parallel to the optical axis, and the at least one drive is a rotary drive for rotation of one or both of the correction elements about the rotation axis.

    摘要翻译： 用于微光刻的光学系统，特别是投影物镜具有光轴和至少一个光学校正装置，其具有第一光学校正元件和至少一个第二光学校正元件，其中第一校正元件设置有 第一非球面表面轮廓，并且其中所述第二校正元件设置有第二非球面轮廓，其中所述第一表面轮廓和所述第二表面轮廓至少近似为零，其中所述校正装置具有至少一个驱动器， 两个校正元素中的至少一个。 在这种情况下，两个校正元件中的至少一个可以围绕至少近似平行于光轴的旋转轴线旋转，并且至少一个驱动器是用于一个或两个校正元件旋转的旋转驱动器 旋转轴。

    OPTICAL ARRANGEMENT IN A PROJECTION EXPOSURE APPARATUS FOR EUV LITHOGRAPHY
    5.
    发明申请
    OPTICAL ARRANGEMENT IN A PROJECTION EXPOSURE APPARATUS FOR EUV LITHOGRAPHY 有权
    投影曝光装置的光学布置

    公开(公告)号：US20120188523A1

    公开(公告)日：2012-07-26

    申请号：US13405882

    申请日：2012-02-27

    申请人： Viktor Kulitsky ,  Bernhard Gellrich ,  Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Peter Deufel ,  Andreas Wurmbrand

    发明人： Viktor Kulitsky ,  Bernhard Gellrich ,  Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Peter Deufel ,  Andreas Wurmbrand

    IPC分类号： G03B27/70 ,  G02B7/182

    CPC分类号： G03F7/70916 ,  G02B7/00 ,  G03F7/70233 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70891

    摘要： An optical arrangement includes a multiplicity of optical elements and a carrier structure which carries the optical elements. The carrier structure is composed of at least two releasably interconnected modules. Each module is composed of at least one carrier structure subelement. A subhousing is produced by a multiplicity of carrier structure subelements and/or modules. The subhousing has a geometry that varies, at least in regions, in correspondence to a usable beam path in the projection exposure apparatus, the usable beam path being defined as an envelope of all light bundles which can propagate from all field points in a field plane to an image plane of the projection exposure apparatus. A projection exposure apparatus for EUV lithography includes such an optical arrangement.

    摘要翻译： 光学装置包括多个光学元件和承载光学元件的载体结构。 载体结构由至少两个可释放地互连的模块组成。 每个模块由至少一个载体结构子元件组成。 子载体由多个载体结构子元件和/或模块产生。 子结构具有至少在区域中对应于投影曝光装置中的可用光束路径而变化的几何形状，可用光束路径被定义为可以在场平面中从所有场点传播的所有光束的包络 到投影曝光装置的像平面。 用于EUV光刻的投影曝光装置包括这种光学装置。

    OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES
    8.
    发明申请
    OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES 有权
    光学元件曝光过程

    公开(公告)号：US20080225247A1

    公开(公告)日：2008-09-18

    申请号：US12046186

    申请日：2008-03-11

    申请人： Tilman Schwertner ,  Ulrich Bingel ,  Guido Limbach ,  Julian Kaller ,  Hans-Juergen Scherle ,  Jens Kugler ,  Dirk Schaffer ,  Bernhard Gellrich

    发明人： Tilman Schwertner ,  Ulrich Bingel ,  Guido Limbach ,  Julian Kaller ,  Hans-Juergen Scherle ,  Jens Kugler ,  Dirk Schaffer ,  Bernhard Gellrich

    IPC分类号： G03B27/54 ,  G03B27/52 ,  G02B23/16

    CPC分类号： G03F7/7015 ,  G02B27/0006 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70883 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70933 ,  Y10T29/49

    摘要： An optical element unit including a first optical element module and a sealing arrangement is disclosed. The first optical element module occupies a first module space and includes a first module component of a first component type and an associated second module component of a second component type. The first component type is optical elements and the second component type being different from the first component type. The sealing arrangement separates the first module space into a first space and a second space and substantially prevents, at least in a first direction, the intrusion of substances from one of the first space and the second space into the other one of the first space and the second space. The first module component at least partially contacts the first space and, at least in its area optically used, not contacting the second space. The second module component at least partially contacts the second space.

    摘要翻译： 公开了一种包括第一光学元件模块和密封装置的光学元件单元。 第一光学元件模块占据第一模块空间并且包括第一组件类型的第一模块组件和第二组件类型的相关联的第二模块组件。 第一部件类型是光学元件，第二部件类型与第一部件类型不同。 密封装置将第一模块空间分隔成第一空间和第二空间，并至少在第一方向上基本上防止物质从第一空间和第二空间中的一个进入第一空间和 第二个空间。 第一模块部件至少部分地接触第一空间，并且至少在其光学使用的区域中不接触第二空间。 第二模块组件至少部分地接触第二空间。