发明申请
US20120125368A1 LIQUID PROCESSING METHOD, LIQUID PROCESSING APPARATUS AND STORAGE MEDIUM STORING PROGRAM FOR PERFORMING LIQUID PROCESSING METHOD
审中-公开
液体加工方法,液体加工设备和储存液体处理方法存储介质储存程序
- 专利标题: LIQUID PROCESSING METHOD, LIQUID PROCESSING APPARATUS AND STORAGE MEDIUM STORING PROGRAM FOR PERFORMING LIQUID PROCESSING METHOD
- 专利标题(中): 液体加工方法,液体加工设备和储存液体处理方法存储介质储存程序
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申请号: US13300739申请日: 2011-11-21
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公开(公告)号: US20120125368A1公开(公告)日: 2012-05-24
- 发明人: Miyako KANEKO , Yasushi FUJII , Kenji SEKIGUCHI
- 申请人: Miyako KANEKO , Yasushi FUJII , Kenji SEKIGUCHI
- 申请人地址: JP Tokyo
- 专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人地址: JP Tokyo
- 优先权: JP2010-260411 20101122; JP2011-180892 20110822
- 主分类号: B08B3/08
- IPC分类号: B08B3/08 ; B08B7/04
摘要:
There are provided a liquid processing method and a liquid processing apparatus capable of removing a resist film without removing an underlying film when removing the resist film from a substrate on which the underlying film and the resist film are formed in sequence from the bottom and into which ions have been previously implanted. In the liquid processing method capable of processing a substrate by a processing solution, the method includes removing the resist film from the substrate by supplying the processing solution at a temperature of about 120° C. or higher to the substrate. The processing solution includes a sulfuric acid and a nitric acid at a preset ratio, and the substrate has thereon the underlying film and the resist film formed on the underlying film, and ions have been previously implanted into the substrate.