Invention Application
- Patent Title: HALOGEN-FREE AND PHOSPHORUS-FREE RESIN FORMULATION AND COMPOSITE MATERIALS PREPARED THEREFROM
- Patent Title (中): 无卤素和无磷酸盐树脂配方及其制备的复合材料
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Application No.: US13078973Application Date: 2011-04-03
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Publication No.: US20120129413A1Publication Date: 2012-05-24
- Inventor: Lu-Shih Liao , Kuo-Chan Chiou
- Applicant: Lu-Shih Liao , Kuo-Chan Chiou
- Applicant Address: TW Hsinchu County
- Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee Address: TW Hsinchu County
- Priority: TW099140317 20101123
- Main IPC: B32B27/12
- IPC: B32B27/12 ; C09D135/02 ; B05D3/10 ; B32B17/02 ; C08L77/00 ; C08F8/30 ; B32B5/02

Abstract:
A halogen-free and phosphorus-free resin formulation, prepared by the following method, is provided. The method includes mixing a carboxy anhydride derivative, diisocyanate, a styrene maleic anhydride (SMA) copolymer derivative and a solvent to form a mixture, and heating the mixture to form a resin formulation. The disclosure also provides a halogen-free and phosphorus-free composite material with a low dielectric constant and flame resistance prepared from the resin formulation.
Public/Granted literature
- US08680196B2 Halogen-free and phosphorus-free resin formulation and composite materials prepared therefrom Public/Granted day:2014-03-25
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