发明申请
US20120133006A1 OXIDE MEMS BEAM 审中-公开
氧化物MEMS光束

OXIDE MEMS BEAM
摘要:
In one embodiment, a semiconductor structure includes a beam positioned within a sealed cavity, the beam including: an upper insulator layer including one or more layers; and a lower insulator layer including one or more layers, wherein a composite stress of the upper insulator layer is different than a composite stress of the lower insulator layer, such that the beam bends.
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