发明申请
US20120135348A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, AND PATTERN FORMING METHOD
审中-公开
丙酸敏感性或辐射敏感性树脂组合物，丙烯酸敏感或辐射敏感膜和图案形成方法
- 专利标题： ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, AND PATTERN FORMING METHOD
- 专利标题（中）： 丙酸敏感性或辐射敏感性树脂组合物，丙烯酸敏感或辐射敏感膜和图案形成方法
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申请号： US13305494申请日： 2011-11-28
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公开(公告)号： US20120135348A1公开(公告)日： 2012-05-31
- 发明人: Akinori SHIBUYA , Yoko TOKUGAWA , Tomoki MATSUDA
- 申请人： Akinori SHIBUYA , Yoko TOKUGAWA , Tomoki MATSUDA
- 申请人地址： JP Tokyo
- 专利权人： FUJIFILM CORPORATION
- 当前专利权人： FUJIFILM CORPORATION
- 当前专利权人地址： JP Tokyo
- 优先权： JP2010-265713 20101129; JP2011-246335 20111110
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03F7/027
摘要：
Provided are an actinic-ray-sensitive or radiation-sensitive resin composition which has improved development defect and is capable of forming a good pattern shape, an actinic-ray-sensitive or radiation-sensitive film formed using the composition, and a pattern forming method using the composition.The actinic-ray-sensitive or radiation-sensitive resin composition includes (A) a compound which generates an acid represented by the following general formula (I) or (I′) upon irradiation with an actinic-ray or a radiation, and (B) a resin which decomposes by an action of an acid to increase a solubility of the resin in an alkaline developer [each of the symbols in the general formulae (I) and (I′) indicates the meaning described in Claims].
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