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    ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, AND PATTERN FORMING METHOD
    1.
    发明申请
    ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, AND PATTERN FORMING METHOD 审中-公开
    丙酸敏感性或辐射敏感性树脂组合物，丙烯酸敏感或辐射敏感膜和图案形成方法

    公开(公告)号：US20120135348A1

    公开(公告)日：2012-05-31

    申请号：US13305494

    申请日：2011-11-28

    申请人： Akinori SHIBUYA ,  Yoko TOKUGAWA ,  Tomoki MATSUDA

    发明人： Akinori SHIBUYA ,  Yoko TOKUGAWA ,  Tomoki MATSUDA

    IPC分类号： G03F7/20 ,  G03F7/027

    CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041

    摘要： Provided are an actinic-ray-sensitive or radiation-sensitive resin composition which has improved development defect and is capable of forming a good pattern shape, an actinic-ray-sensitive or radiation-sensitive film formed using the composition, and a pattern forming method using the composition.The actinic-ray-sensitive or radiation-sensitive resin composition includes (A) a compound which generates an acid represented by the following general formula (I) or (I′) upon irradiation with an actinic-ray or a radiation, and (B) a resin which decomposes by an action of an acid to increase a solubility of the resin in an alkaline developer [each of the symbols in the general formulae (I) and (I′) indicates the meaning described in Claims].

    摘要翻译： 提供了具有改善的显影缺陷并能够形成良好图案形状的光化学敏感或辐射敏感性树脂组合物，使用该组合物形成的光化射线敏感性或辐射敏感性膜，以及图案形成方法 使用组合。 光化学射线敏感性或辐射敏感性树脂组合物包括（A）在用光化射线或辐射照射时产生由以下通式（I）或（I'）表示的酸的化合物，和（B ）通过酸的作用分解以增加树脂在碱性显影剂中的溶解度的树脂（通式（I）和（I'）中的每个符号表示权利要求中所述的含义]。

    ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME
    3.
    发明申请
    ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME 审中-公开
    化学敏感性或辐射敏感性树脂组合物，以及丙烯酸敏感或辐射敏感性膜和使用其的图案形成方法

    公开(公告)号：US20120164574A1

    公开(公告)日：2012-06-28

    申请号：US13324538

    申请日：2011-12-13

    申请人： Yoko TOKUGAWA ,  Mitsuhiro FUJITA ,  Tomoki MATSUDA

    发明人： Yoko TOKUGAWA ,  Mitsuhiro FUJITA ,  Tomoki MATSUDA

    IPC分类号： G03F7/20 ,  G03F7/075 ,  G03F7/027 ,  G03F7/004

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0758 ,  G03F7/2041

    摘要： Provided is an actinic-ray-sensitive or radiation-sensitive resin composition that is excellent in depth of focus and density distribution dependency, and an actinic-ray-sensitive or radiation-sensitive film and a pattern forming method using the same.An actinic-ray-sensitive or radiation-sensitive resin composition according to the present invention includes (A) a first resin which decomposes by an action of an acid to increase a solubility of the first resin in an alkaline developer, (B) a second resin which includes at least one of a fluorine atom and a silicon atom and is different from the first resin, and (C) an onium salt which includes a nitrogen atom in a cation portion and generates an acid by being decomposed upon irradiation with actinic-ray or radiation.

    摘要翻译： 本发明提供了聚焦深度和密度分布依赖性优异的光化射线敏感性或辐射敏感性的树脂组合物，以及使用其的光化学敏感性或光敏感性的薄膜和图案形成方法。 根据本发明的光化射线敏感或辐射敏感性树脂组合物包括（A）通过酸的作用分解以增加第一树脂在碱性显影剂中的溶解度的第一树脂，（B）第二树脂 包括氟原子和硅原子中的至少一个并且与第一树脂不同的树脂，和（C）在阳离子部分中包含氮原子的鎓盐，并且通过在光化学反应下照射而分解产生酸， 射线或辐射。