发明申请
- 专利标题: FAST MEASUREMENT OF X-RAY DIFFRACTION FROM TILTED LAYERS
- 专利标题(中): 从倾斜层快速测量X射线衍射
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申请号: US12958420申请日: 2010-12-02
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公开(公告)号: US20120140889A1公开(公告)日: 2012-06-07
- 发明人: John Wall , David Jacques , Boris Yokhin , Alexander Krokhmal , Paul Ryan , Richard Bytheway , David Berman , Matthew Wormington
- 申请人: John Wall , David Jacques , Boris Yokhin , Alexander Krokhmal , Paul Ryan , Richard Bytheway , David Berman , Matthew Wormington
- 申请人地址: IL Migdal HaEmek
- 专利权人: JORDAN VALLEY SEMICONDUCTORS LTD.
- 当前专利权人: JORDAN VALLEY SEMICONDUCTORS LTD.
- 当前专利权人地址: IL Migdal HaEmek
- 主分类号: G01N23/207
- IPC分类号: G01N23/207
摘要:
A method for analysis includes directing a converging beam of X-rays toward a surface of a sample having multiple single-crystal layers, including at least a first layer and a second layer that is formed over and tilted relative to the first layer. The X-rays that are diffracted from each of the first and second layers are sensed simultaneously while resolving the sensed X-rays as a function of angle so as to generate a diffraction spectrum including at least a first diffraction peak due to the first layer and a second diffraction peak due to the second layer. The diffraction spectrum is analyzed so as to identify a characteristic of at least the second layer.
公开/授权文献
- US08437450B2 Fast measurement of X-ray diffraction from tilted layers 公开/授权日:2013-05-07
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