发明申请
- 专利标题: VAPOR PHASE GROWTH APPARATUS
- 专利标题(中): 蒸气相生长装置
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申请号: US13383876申请日: 2010-07-12
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公开(公告)号: US20120160170A1公开(公告)日: 2012-06-28
- 发明人: Akira Yamaguchi , Koh Matsumoto , Kosuke Uchiyama
- 申请人: Akira Yamaguchi , Koh Matsumoto , Kosuke Uchiyama
- 申请人地址: JP Tokyo
- 专利权人: TAIYO NIPPON SANSO CORPORATION
- 当前专利权人: TAIYO NIPPON SANSO CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2009-166831 20090715
- 国际申请: PCT/JP2010/061767 WO 20100712
- 主分类号: C23C16/455
- IPC分类号: C23C16/455
摘要:
Disclosed is a rotation/revolution type vapor phase growth apparatus that can maintain constant flow rates of a purge gas and a raw material gas when a raw material gas introducing direction is set to be the same as a susceptor rotation introducing direction. Inside a hollow drive shaft 12 supporting and rotating a disk-shaped susceptor 13, a raw material gas supply tube 20 is coaxially disposed, and between the hollow drive shaft and the raw material gas supply tube, a purge gas flow path 21 is formed. Additionally, in a purge gas introducing nozzle introducing a purge gas in an outer circumferential direction of a flow channel 18 from the purge gas flow path, a gas introducing path 19c is formed in a direction parallel to an upper surface of the susceptor in such a manner as to make a vertical dimension of the gas introducing path constant.