Disclosed is a rotation/revolution type vapor phase growth apparatus that can maintain constant flow rates of a purge gas and a raw material gas when a raw material gas introducing direction is set to be the same as a susceptor rotation introducing direction. Inside a hollow drive shaft 12 supporting and rotating a disk-shaped susceptor 13, a raw material gas supply tube 20 is coaxially disposed, and between the hollow drive shaft and the raw material gas supply tube, a purge gas flow path 21 is formed. Additionally, in a purge gas introducing nozzle introducing a purge gas in an outer circumferential direction of a flow channel 18 from the purge gas flow path, a gas introducing path 19c is formed in a direction parallel to an upper surface of the susceptor in such a manner as to make a vertical dimension of the gas introducing path constant.