发明申请
US20120167819A1 METHOD FOR RECONSTRUCTING A SEMICONDUCTOR TEMPLATE 审中-公开
重构半导体模板的方法

METHOD FOR RECONSTRUCTING A SEMICONDUCTOR TEMPLATE
摘要:
The disclosed subject matter pertains to deposition of thin film or thin foil materials in general, but more specifically to deposition of epitaxial monocrystalline or quasi-monocrystalline silicon film (epi film) for use in manufacturing of high efficiency solar cells. In operation, methods are disclosed which extend the reusable life and to reduce the amortized cost of a substrate or template used in the manufacturing process of silicon solar cells. Further, methods are disclosed which provide for the conversion of a low quality starting surface into an improved quality starting surface of a silicon wafer.
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