Invention Application
US20120171618A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING A PATTERN USING THE SAME
审中-公开
抗紫外线或辐射敏感性树脂组合物及其形成图案的方法
- Patent Title: ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING A PATTERN USING THE SAME
- Patent Title (中): 抗紫外线或辐射敏感性树脂组合物及其形成图案的方法
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Application No.: US13421680Application Date: 2012-03-15
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Publication No.: US20120171618A1Publication Date: 2012-07-05
- Inventor: Yusuke IIZUKA , Hidenori TAKAHASHI , Michihiro SHIRAKAWA , Masahiro YOSHIDOME , Shuji HIRANO
- Applicant: Yusuke IIZUKA , Hidenori TAKAHASHI , Michihiro SHIRAKAWA , Masahiro YOSHIDOME , Shuji HIRANO
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM CORPORATION
- Current Assignee: FUJIFILM CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2009-217366 20090918; JP2009-274903 20091202; JP2010-036669 20100222
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/004
Abstract:
According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin containing a repeating unit (A) containing both a structural moiety (S1) that is decomposed by an action of an acid to thereby generate an alkali-soluble group and a structural moiety (S2) that is decomposed by an action of an alkali developer to thereby increase its rate of dissolution into the alkali developer, and a compound that generates an acid when exposed to actinic rays or radiation.
Information query
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