公开(公告)号：US09152048B2

公开(公告)日：2015-10-06

申请号：US12905742

申请日：2010-10-15

Applicant: Hiroshi Saegusa ,  Kaoru Iwato ,  Yusuke Iizuka ,  Kousuke Koshijima

Inventor： Hiroshi Saegusa ,  Kaoru Iwato ,  Yusuke Iizuka ,  Kousuke Koshijima

IPC: G03F7/004 ,  G03F7/38 ,  G03F7/039 ,  G03F7/075 ,  G03F7/20

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0758 ,  G03F7/2041 ,  G03F7/38

Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes (A) a resin that when acted on by an acid, increases its solubility in an alkali developer, (B) a compound that when exposed to actinic rays or radiation, generates an acid, and (C) a resin containing at least one group selected from among the following groups (x) to (z) and further containing at least either a fluorine atom or a silicon atom, in which three or more polymer chains are contained through at least one branch point, (x) an alkali-soluble group, (y) a group that when acted on by an alkali developer, is decomposed to thereby increase its solubility in the alkali developer, and (z) a group that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer.

Abstract translation: 根据一个实施方案，光化射线或辐射敏感性树脂组合物包含（A）当被酸作用时增加其在碱性显影剂中的溶解度的树脂，（B）当暴露于光化射线或 辐射，产生酸，和（C）含有选自下列基团（x）至（z）中的至少一种基团并且还含有至少一个氟原子或硅原子的树脂，其中三种或更多种聚合物 链通过至少一个分支点包含（x）碱溶性基团，（y）当被碱显影剂作用时分解的基团被分解，从而增加其在碱性显影剂中的溶解度，和（z）a 当被酸作用时，其被分解，从而增加其在碱性显影剂中的溶解度。

公开(公告)号：US08362170B2

公开(公告)日：2013-01-29

申请号：US13525583

申请日：2012-06-18

Applicant: Shuji Hirano ,  Kaoru Iwato ,  Hiroshi Saegusa ,  Yusuke Iizuka

Inventor： Shuji Hirano ,  Kaoru Iwato ,  Hiroshi Saegusa ,  Yusuke Iizuka

IPC: C08F24/00

CPC classification number: C07D493/20 ,  C07D493/14 ,  C08F220/30

Abstract: Provided is a polymerizable compound represented by the following general formula (ca-1) or (cb-1): wherein the variables in the formulae are defined in the specification.

Abstract translation: 提供由以下通式（ca-1）或（cb-1）表示的可聚合化合物：其中式中的变量在说明书中定义。

公开(公告)号：US08802349B2

公开(公告)日：2014-08-12

申请号：US13258898

申请日：2010-03-31

Applicant: Masahiro Yoshidome ,  Shuji Hirano ,  Hiroshi Saegusa ,  Kaoru Iwato ,  Yusuke Iizuka

Inventor： Masahiro Yoshidome ,  Shuji Hirano ,  Hiroshi Saegusa ,  Kaoru Iwato ,  Yusuke Iizuka

IPC: G03F7/004 ,  G03F7/38 ,  G03F7/039

CPC classification number: G03F7/0397 ,  G03F7/0046 ,  G03F7/0758 ,  G03F7/2041 ,  G03F7/38 ,  Y10S430/108 ,  Y10S430/111

Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, the resin containing (a) a repeating unit represented by the following formula (AN-01), (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a resin that contains at least either a fluorine atom or a silicon atom and contains a repeating unit having a group capable of decomposing by the action of an alkali developer to increase the solubility in an alkali developer: wherein the variables in formula (AN-01) are defined in the description.

Abstract translation: 本发明提供一种光化学射线敏感性或辐射敏感性树脂组合物，其包含：（A）能够通过酸作用增加在碱性显影剂中的溶解性的树脂，所述树脂含有（a）由下式表示的重复单元 （AN-01），（B）能够在用光化射线或辐射照射时能够产生酸的化合物，和（C）含有至少一个氟原子或硅原子的树脂，并且含有具有 能够通过碱显影剂的作用分解以提高在碱性显影剂中的溶解度的组：其中式（AN-01）中的变量在说明书中定义。

公开(公告)号：US20130095429A1

公开(公告)日：2013-04-18

申请号：US13807508

申请日：2011-07-07

Applicant: Yusuke Iizuka ,  Akinori Shibuya ,  Hidenori Takahashi ,  Toshiaki Fukuhara ,  Kousuke Koshijima

Inventor： Yusuke Iizuka ,  Akinori Shibuya ,  Hidenori Takahashi ,  Toshiaki Fukuhara ,  Kousuke Koshijima

IPC: G03F7/004 ,  G03F7/20

CPC classification number: G03F7/004 ,  C08F12/20 ,  C08F12/22 ,  C08F12/32 ,  C08F212/14 ,  C08F212/32 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/20 ,  G03F7/2041

Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition that simultaneously achieves excellent developability and excellent immersion-liquid tracking properties, and a method of forming a pattern using the same. The composition contains a resin (B) containing at least either a fluorine atom or a silicon atom, the resin (B) containing any of repeating units of general formula (I) below.

Abstract translation: 本发明提供一种同时具有优异的显影性和优良的浸液追踪性的光化射线或辐射敏感性树脂组合物，以及使用其形成图案的方法。 该组合物含有至少含有氟原子或硅原子的树脂（B），该树脂（B）含有下述通式（I）的重复单元。

公开(公告)号：US20120271021A1

公开(公告)日：2012-10-25

申请号：US13525583

申请日：2012-06-18

Applicant: Shuji HIRANO ,  Kaoru IWATO ,  Hiroshi SAEGUSA ,  Yusuke IIZUKA

Inventor： Shuji HIRANO ,  Kaoru IWATO ,  Hiroshi SAEGUSA ,  Yusuke IIZUKA

IPC: C07D493/14 ,  C08F124/00 ,  C08F120/22

CPC classification number: C07D493/20 ,  C07D493/14 ,  C08F220/30

Abstract: Provided is a polymerizable compound represented by the following general formula (ca-1) or (cb-1): wherein the variables in the formulae are defined in the specification.

Abstract translation: 提供由以下通式（ca-1）或（cb-1）表示的可聚合化合物：其中式中的变量在说明书中定义。

公开(公告)号：US20120171618A1

公开(公告)日：2012-07-05

申请号：US13421680

申请日：2012-03-15

Applicant: Yusuke IIZUKA ,  Hidenori TAKAHASHI ,  Michihiro SHIRAKAWA ,  Masahiro YOSHIDOME ,  Shuji HIRANO

Inventor： Yusuke IIZUKA ,  Hidenori TAKAHASHI ,  Michihiro SHIRAKAWA ,  Masahiro YOSHIDOME ,  Shuji HIRANO

IPC: G03F7/20 ,  G03F7/004

CPC classification number: C08F220/26 ,  G03F7/0397 ,  G03F7/2041

Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin containing a repeating unit (A) containing both a structural moiety (S1) that is decomposed by an action of an acid to thereby generate an alkali-soluble group and a structural moiety (S2) that is decomposed by an action of an alkali developer to thereby increase its rate of dissolution into the alkali developer, and a compound that generates an acid when exposed to actinic rays or radiation.

Abstract translation: 根据一个实施方案，光化射线或辐射敏感性树脂组合物包含含有重复单元（A）的树脂，所述重复单元（A）含有通过酸的作用而分解的结构部分（S1），从而产生碱溶性 基团和通过碱性显影剂的作用分解的结构部分（S2），从而增加其对碱性显影剂的溶解速率，以及当暴露于光化射线或辐射时产生酸的化合物。

公开(公告)号：US20100152401A1

公开(公告)日：2010-06-17

申请号：US12635998

申请日：2009-12-11

Applicant: Shuji HIRANO ,  Kaoru IWATO ,  Hiroshi SAEGUSA ,  Yusuke IIZUKA

Inventor： Shuji HIRANO ,  Kaoru IWATO ,  Hiroshi SAEGUSA ,  Yusuke IIZUKA

IPC: C08F24/00 ,  C07D493/20

CPC classification number: C07D493/20 ,  C07D493/14 ,  C08F220/30

Abstract: Provided is a polymerizable compound represented by the following general formula (ca-1) or (cb-1): wherein the variables in the formulae are defined in the specification.

Abstract translation: 提供由以下通式（ca-1）或（cb-1）表示的可聚合化合物：其中式中的变量在说明书中定义。

公开(公告)号：US09034558B2

公开(公告)日：2015-05-19

申请号：US13808489

申请日：2011-09-28

Applicant: Shuhei Yamaguchi ,  Akinori Shibuya ,  Yusuke Iizuka

Inventor： Shuhei Yamaguchi ,  Akinori Shibuya ,  Yusuke Iizuka

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/20 ,  C08F12/20 ,  C08F12/22 ,  C08F12/26 ,  C08F12/30 ,  C08F212/12 ,  G03F7/11 ,  C08F212/14 ,  C08F220/42 ,  C08F220/28

CPC classification number: G03F7/004 ,  C08F12/20 ,  C08F12/22 ,  C08F12/26 ,  C08F12/30 ,  C08F212/12 ,  C08F212/14 ,  C08F220/42 ,  C08F2220/281 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  Y10S430/108 ,  C08F2220/1858 ,  C08F220/30 ,  C08F2220/1891

Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition including (A) a compound that when exposed to actinic rays or radiation, generates an acid, (B) a resin that when acted on by an acid, increases its rate of dissolution in an alkali developer, and (C) a hydrophobic resin, wherein the hydrophobic resin (C) contains a repeating unit derived from any of monomers of general formula (1) below.

Abstract translation: 提供了一种光化射线或辐射敏感性树脂组合物，其包含（A）当暴露于光化射线或辐射时产生酸的化合物，（B）当被酸作用时增加其溶解速率的树脂 在碱显影剂中，和（C）疏水性树脂，其中所述疏水性树脂（C）含有衍生自下述通式（1）的任何一种的重复单元。

公开(公告)号：US08841060B2

公开(公告)日：2014-09-23

申请号：US13537843

申请日：2012-06-29

Applicant: Shohei Kataoka ,  Yusuke Iizuka ,  Akinori Shibuya ,  Tomoki Matsuda ,  Naohiro Tango

Inventor： Shohei Kataoka ,  Yusuke Iizuka ,  Akinori Shibuya ,  Tomoki Matsuda ,  Naohiro Tango

IPC: G03F7/004 ,  G03F7/20 ,  G03F7/11 ,  G03F7/039

CPC classification number: G03F7/2041 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/11 ,  Y10S430/106 ,  Y10S430/114 ,  Y10S430/128 ,  Y10T428/24802

Abstract: An actinic-ray-sensitive or radiation-sensitive resin composition which is capable of improving line edge roughness (LER) and inhibiting pattern collapse, a resist film and a pattern forming method each using the same, a method for preparing an electronic device, and an electronic device are provided.The actinic-ray-sensitive or radiation-sensitive resin composition contains: (A) a resin having repeating units having a structure represented by any one of the following general formulae (I-1) to (I-3), and repeating units containing at least one selected from the group consisting of a lactone structure, a sultone structure, and a cyano group; and (B) a compound that generates an acid by irradiation with actinic rays or radiations.

Abstract translation: 能够改善线边缘粗糙度（LER）并抑制图案塌陷的光化射线敏感性或辐射敏感性树脂组合物，抗蚀剂膜和各自使用它们的图案形成方法，制备电子器件的方法和 提供电子设备。 光化射线敏感性或辐射敏感性树脂组合物含有：（A）具有由以下通式（I-1）至（I-3）中任一个表示的结构的重复单元的树脂和含 选自内酯结构，磺内酯结构和氰基中的至少一种; 和（B）通过用光化射线或辐射照射产生酸的化合物。

公开(公告)号：US08795944B2

公开(公告)日：2014-08-05

申请号：US13139193

申请日：2009-12-11

Applicant: Hiroshi Saegusa ,  Kaoru Iwato ,  Shuji Hirano ,  Yusuke Iizuka

Inventor： Hiroshi Saegusa ,  Kaoru Iwato ,  Shuji Hirano ,  Yusuke Iizuka

IPC: G03F7/004 ,  G03F7/028 ,  G03F7/039 ,  G03F7/26

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0758 ,  G03F7/2041

Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a resin which contains (c) a repeating unit having at least one polarity conversion group and has at least either a fluorine atom or a silicon atom.

Abstract translation: 本发明提供一种光化学射线敏感性或辐射敏感性树脂组合物，其包含：（A）能够通过酸的作用增加在碱性显影剂中的溶解性的树脂，（B）在照射时能够产生酸的化合物 光化射线或辐射，以及（C）含有（c）具有至少一个极性转换基并且至少具有氟原子或硅原子的重复单元的树脂。