发明申请
- 专利标题： METAL OXIDE-METAL COMPOSITE SPUTTERING TARGET
- 专利标题（中）： 金属氧化物金属复合溅射靶
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申请号： US13496899申请日： 2010-09-15
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公开(公告)号： US20120181172A1公开(公告)日： 2012-07-19
- 发明人: Hitoshi Matsuzaki , Katsutoshi Takagi , Norihiro Jiko , Masaya Ehira
- 申请人： Hitoshi Matsuzaki , Katsutoshi Takagi , Norihiro Jiko , Masaya Ehira
- 申请人地址： JP Kobe-shi
- 专利权人： KOBELCO RESEARCH INSTITUTE, INC.
- 当前专利权人： KOBELCO RESEARCH INSTITUTE, INC.
- 当前专利权人地址： JP Kobe-shi
- 优先权： JP2009-217750 20090918; JP2010-028094 20100210
- 国际申请： PCT/JP10/65988 WO 20100915
- 主分类号： C23C14/34
- IPC分类号： C23C14/34 ; C23C14/08
摘要：
Disclosed is a metal oxide-metal composite sputtering target which is useful for the formation of a recording layer for an optical information recording medium, said recording layer containing a metal oxide and a metal. Specifically disclosed is a composite sputtering target containing a metal oxide (A) and a metal (B), wherein the maximum value of the circle-equivalent diameter of the metal oxide (A) is controlled to 200 μm or less.