发明申请
- 专利标题: RADIATION-SENSITIVE RESIN COMPOSITION
- 专利标题(中): 辐射敏感性树脂组合物
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申请号: US13338260申请日: 2011-12-28
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公开(公告)号: US20120183902A1公开(公告)日: 2012-07-19
- 发明人: Hiroki Nakagawa , Takehiko Naruoka , Shinichi Nakamura , Kazuki Kasahara
- 申请人: Hiroki Nakagawa , Takehiko Naruoka , Shinichi Nakamura , Kazuki Kasahara
- 申请人地址: JP Tokyo
- 专利权人: JSR Corporation
- 当前专利权人: JSR Corporation
- 当前专利权人地址: JP Tokyo
- 优先权: JP2009-158122 20090702
- 主分类号: G03F7/027
- IPC分类号: G03F7/027
摘要:
A radiation-sensitive resin composition includes an acid-labile group-containing resin, a radiation-sensitive acid generating agent, and an acid diffusion controller including a first compound shown by a following general formula (1-1) and a second compound shown by a following general formula (1-2) or (1-3). In the formula (1-1), each of R1 and R2 individually represents a hydrogen atom or the like, and Rp represents an acid-labile group. In the formula (1-2), R3 represents a hydrogen atom or the like, and each of R4 to R6 individually represents a hydrogen atom or the like. In the formula (1-3), R3 represents a hydrogen atom or the like, Rq represents a single bond or the like, and each of R5 and R6 individually represents a hydrogen atom or the like.