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公开(公告)号：US20120183902A1
公开(公告)日：2012-07-19
申请号：US13338260
申请日：2011-12-28
IPC分类号： G03F7/027
CPC分类号： G03F7/0397 , G03F7/0045
摘要： A radiation-sensitive resin composition includes an acid-labile group-containing resin, a radiation-sensitive acid generating agent, and an acid diffusion controller including a first compound shown by a following general formula (1-1) and a second compound shown by a following general formula (1-2) or (1-3). In the formula (1-1), each of R1 and R2 individually represents a hydrogen atom or the like, and Rp represents an acid-labile group. In the formula (1-2), R3 represents a hydrogen atom or the like, and each of R4 to R6 individually represents a hydrogen atom or the like. In the formula (1-3), R3 represents a hydrogen atom or the like, Rq represents a single bond or the like, and each of R5 and R6 individually represents a hydrogen atom or the like.
摘要翻译： 辐射敏感性树脂组合物包括含酸不稳定基团的树脂，辐射敏感性酸产生剂和包含由以下通式（1-1）表示的第一化合物的酸扩散控制剂和由 以下通式（1-2）或（1-3）。 式（1-1）中，R 1和R 2分别表示氢原子等，R p表示酸不稳定基。 式（1-2）中，R3表示氢原子等，R4〜R6各自表示氢原子等。 在式（1-3）中，R 3表示氢原子等，R q表示单键等，R 5和R 6各自表示氢原子等。
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公开(公告)号：US20130107235A1
公开(公告)日：2013-05-02
申请号：US13283582
申请日：2011-10-28
IPC分类号： G03B27/52
CPC分类号： G03F7/40 , G03F7/0397 , G03F7/325 , G03F7/405 , H01L21/0337
摘要： A pattern-forming method includes applying a photoresist composition to a substrate to form a resist film. The photoresist composition includes an acid generator and a first polymer that includes an acid-dissociable group. The resist film is exposed. The resist film is developed using a developer having an organic solvent content of 80 mass % or more to form a prepattern of the resist film. A polymer film having a phase separation structure in a space defined by the prepattern is formed using a composition that includes a plurality of second polymers. A part of the phase separation structure of the polymer film is removed.
摘要翻译： 图案形成方法包括将光致抗蚀剂组合物施加到基底以形成抗蚀剂膜。 光致抗蚀剂组合物包括酸产生剂和包含酸解离基团的第一聚合物。 抗蚀剂膜被曝光。 使用有机溶剂含量为80质量％以上的显影剂显影抗蚀剂膜，以形成抗蚀剂膜的前体图案。 使用包含多个第二聚合物的组合物形成在由预制图案限定的空间中具有相分离结构的聚合物膜。 除去聚合物膜的相分离结构的一部分。
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公开(公告)号：US08703395B2
公开(公告)日：2014-04-22
申请号：US13283582
申请日：2011-10-28
IPC分类号： G03F7/26
CPC分类号： G03F7/40 , G03F7/0397 , G03F7/325 , G03F7/405 , H01L21/0337
摘要： A pattern-forming method includes applying a photoresist composition to a substrate to form a resist film. The photoresist composition includes an acid generator and a first polymer that includes an acid-dissociable group. The resist film is exposed. The resist film is developed using a developer having an organic solvent content of 80 mass % or more to form a prepattern of the resist film. A polymer film having a phase separation structure in a space defined by the prepattern is formed using a composition that includes a plurality of second polymers. A part of the phase separation structure of the polymer film is removed.
摘要翻译： 图案形成方法包括将光致抗蚀剂组合物施加到基底以形成抗蚀剂膜。 光致抗蚀剂组合物包括酸产生剂和包含酸解离基团的第一聚合物。 抗蚀剂膜被曝光。 使用有机溶剂含量为80质量％以上的显影剂显影抗蚀剂膜，以形成抗蚀剂膜的前体图案。 使用包含多个第二聚合物的组合物形成在由预制图案限定的空间中具有相分离结构的聚合物膜。 除去聚合物膜的相分离结构的一部分。
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公开(公告)号：US08697331B2
公开(公告)日：2014-04-15
申请号：US12949795
申请日：2010-11-19
申请人： Hirokazu Sakakibara , Takehiko Naruoka , Makoto Shimizu , Yukio Nishimura , Nobuji Matsumura , Yuusuke Asano
发明人： Hirokazu Sakakibara , Takehiko Naruoka , Makoto Shimizu , Yukio Nishimura , Nobuji Matsumura , Yuusuke Asano
CPC分类号： C07C69/96 , C08F220/18 , C08F220/22 , C08F220/24 , C08F220/26 , C09D133/18 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A compound is shown by a following formula (1), wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R2 represents a methylene group, an ethylene group, a 1-methylethylene group, a 2-methylethylene group, a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, or a derivative thereof, each of R3 represents at least one of a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, a derivative thereof, and a linear or branched alkyl group having 1 to 4 carbon atoms, provided that two of R3 may bond to form a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof together with the carbon atom that is bonded thereto, and X represents a linear or branched fluoroalkylene group having 1 to 20 carbon atoms.
摘要翻译： 化合物由下式（1）表示，其中R1表示氢原子，甲基或三氟甲基，R2表示亚甲基，亚乙基，1-甲基亚乙基，2-甲基亚乙基， 碳原子数4〜20的二价脂环式烃基或其衍生物，各R3表示碳原子数为4〜20的一价脂环族烃基，其衍生物和具有1个碳原子的直链或支链烷基中的至少一种 至4个碳原子，条件是R3中的两个可以键合形成具有4至20个碳原子的二价脂环族烃基或其衍生物和与其键合的碳原子，并且X表示具有1个碳原子的直链或支链氟亚烷基 至20个碳原子。
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公开(公告)号：US20100255420A1
公开(公告)日：2010-10-07
申请号：US12740111
申请日：2008-10-21
申请人： Hirokazu Sakakibara , Makoto Shimizu , Takehiko Naruoka , Yoshifumi Ooizumi , Kentarou Harada , Takuma Ebata
发明人： Hirokazu Sakakibara , Makoto Shimizu , Takehiko Naruoka , Yoshifumi Ooizumi , Kentarou Harada , Takuma Ebata
IPC分类号： G03C1/00 , C08F118/02
CPC分类号： G03F7/0397 , C08F220/18 , C08L2312/06 , C09D133/14 , C09D133/16 , G03F7/0045 , G03F7/0046 , G03F7/2041 , C08F220/24 , C08F220/38
摘要： A radiation-sensitive resin composition includes a polymer, an acid-labile group-containing resin, a radiation-sensitive acid generator, and a solvent, the polymer including repeating units shown by following general formulas (1) and (2). wherein R1 and R2 represent a hydrogen atom, a methyl group, or a trifluoromethyl group, R3 represents a linear or branched alkyl group having 1 to 6 carbon atoms or an alicyclic hydrocarbon group having 4 to 20 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom, or a derivative thereof, and Z represents a group that includes a group that generates an acid upon exposure to light. The radiation-sensitive resin composition produces an excellent pattern shape, reduces the amount of elution into an immersion liquid upon contact during liquid immersion lithography, ensures that a high receding contact angle is formed by a resist film and an immersion liquid, and rarely causes development defects.
摘要翻译： 辐射敏感性树脂组合物包括聚合物，含酸不稳定基团的树脂，辐射敏感性酸产生剂和溶剂，所述聚合物包括由以下通式（1）和（2）表示的重复单元。 其中R 1和R 2表示氢原子，甲基或三氟甲基，R 3表示碳原子数1〜6的直链或支链烷基或碳原子数4〜20的脂环式烃基，其中至少一个氢原子 被氟原子或其衍生物取代，Z表示包含在曝光时产生酸的基团的基团。 放射线敏感性树脂组合物产生优异的图案形状，在液浸光刻期间减少接触时浸入液中的洗脱量，确保通过抗蚀剂膜和浸渍液形成高后退接触角，并且很少引起显影 缺陷
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公开(公告)号：US09598520B2
公开(公告)日：2017-03-21
申请号：US13473957
申请日：2012-05-17
申请人： Yuko Kiridoshi , Takehiko Naruoka , Yukio Nishimura , Yusuke Asano , Takanori Kawakami , Hiromitsu Nakashima
发明人： Yuko Kiridoshi , Takehiko Naruoka , Yukio Nishimura , Yusuke Asano , Takanori Kawakami , Hiromitsu Nakashima
IPC分类号： G03F7/004 , G03F7/38 , C08F220/24 , C08F228/00 , C08F220/22 , C08L33/14 , G03F7/039 , G03F7/11 , G03F7/20
CPC分类号： C08F220/22 , C08F220/24 , C08F228/00 , C08L33/14 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041 , C08L101/00
摘要： A radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation-sensitive acid generator. The first polymer has a structure unit represented by a following formula (1-1), a structure unit represented by a following formula (1-2), or both thereof, and has a content of fluorine atoms of no less than 5% by mass to a total mass of the first polymer. The second polymer has an acid-dissociable group, and has a content of fluorine atoms of less than 5% by mass to a total mass of the second polymer.
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公开(公告)号：US08722306B2
公开(公告)日：2014-05-13
申请号：US12602769
申请日：2008-05-26
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/30 , C08F2220/1808 , G03F7/0045 , G03F7/0392
摘要： A radiation-sensitive resin composition includes a resin (A1) that includes a repeating unit shown by the following formula (1-1) and a repeating unit shown by the following formula (1-2), and a radiation-sensitive acid generator (B). The radiation-sensitive resin composition exhibits excellent sensitivity, and can reduce a mask error factor (MEEF). wherein R1, R2, and R3 individually represent a linear or branched alkyl group having 1 to 4 carbon atoms, R4 represents a hydrogen atom, a linear or branched alkyl group having 2 to 4 carbon atoms, a linear or branched fluoroalkyl group having 1 to 4 carbon atoms, or a linear or branched alkoxy group having 1 to 4 carbon atoms, and q represents an integer from 0 to 3.
摘要翻译： 辐射敏感性树脂组合物包括含有下述式（1-1）表示的重复单元和下述式（1-2）所示的重复单元的树脂（A1）和放射线敏感性酸发生剂 B）。 辐射敏感性树脂组合物显示出优异的灵敏度，并且可以降低掩模误差因子（MEEF）。 其中R1，R2和R3分别表示碳原子数为1〜4的直链或支链烷基，R4表示氢原子，碳原子数2〜4的直链或支链烷基，具有1〜 4个碳原子，或具有1〜4个碳原子的直链或支链烷氧基，q表示0〜3的整数。
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公开(公告)号：US20100178608A1
公开(公告)日：2010-07-15
申请号：US12602769
申请日：2008-05-26
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/30 , C08F2220/1808 , G03F7/0045 , G03F7/0392
摘要： A radiation-sensitive resin composition includes a resin (A1) that includes a repeating unit shown by the following formula (1-1) and a repeating unit shown by the following formula (1-2), and a radiation-sensitive acid generator (B). The radiation-sensitive resin composition exhibits excellent sensitivity, and can reduce a mask error factor (MEEF). wherein R1, R2, and R3 individually represent a linear or branched alkyl group having 1 to 4 carbon atoms, R4 represents a hydrogen atom, a linear or branched alkyl group having 2 to 4 carbon atoms, a linear or branched fluoroalkyl group having 1 to 4 carbon atoms, or a linear or branched alkoxy group having 1 to 4 carbon atoms, and q represents an integer from 0 to 3.
摘要翻译： 辐射敏感性树脂组合物包括含有下述式（1-1）表示的重复单元和下述式（1-2）所示的重复单元的树脂（A1）和放射线敏感性酸发生剂 B）。 辐射敏感性树脂组合物显示出优异的灵敏度，并且可以降低掩模误差因子（MEEF）。 其中R1，R2和R3分别代表具有1-4个碳原子的直链或支链烷基，R4代表氢原子，具有2至4个碳原子的直链或支链烷基，具有1〜 4个碳原子，或具有1〜4个碳原子的直链或支链烷氧基，q表示0〜3的整数。
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9.发明授权Compound, fluorine-containing polymer, radiation-sensitive resin composition and method for producing compound 有权化合物，含氟聚合物，辐射敏感性树脂组合物及其制备方法公开(公告)号：US08530692B2
公开(公告)日：2013-09-10
申请号：US13216209
申请日：2011-08-23
CPC分类号： C07C69/96 , C07C68/06 , C07C2601/14 , C08F220/30 , G03F7/0046 , G03F7/0392
摘要： A compound has a following general formula (1). R0 represents an (n+1)-valent linear or branched aliphatic hydrocarbon group having 1 to 10 carbon atoms, or the like. R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group. R2 represents a single bond or the like. R3 represent a linear or branched alkyl group having 1 to 4 carbon atoms or the like. X represents a linear or branched fluoroalkylene group having 1 to 10 carbon atoms, and n is an integer from 1 to 5.
摘要翻译： 化合物具有以下通式（1）。 R 0表示具有1〜10个碳原子的（n + 1）价的直链或支链脂肪族烃基等。 R1表示氢原子，甲基或三氟甲基。 R2表示单键等。 R 3表示具有1〜4个碳原子的直链或支链烷基等。 X表示碳原子数1〜10的直链状或支链状的氟代亚烷基，n表示1〜5的整数。
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公开(公告)号：US20110104611A1
公开(公告)日：2011-05-05
申请号：US12949795
申请日：2010-11-19
申请人： Hirokazu Sakakibara , Takehiko Naruoka , Makoto Shimizu , Yukio Nishimura , Nobuji Matsumura , Yuusuke Asano
发明人： Hirokazu Sakakibara , Takehiko Naruoka , Makoto Shimizu , Yukio Nishimura , Nobuji Matsumura , Yuusuke Asano
IPC分类号： G03F7/004 , C07C69/96 , C08F120/22
CPC分类号： C07C69/96 , C08F220/18 , C08F220/22 , C08F220/24 , C08F220/26 , C09D133/18 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A compound is shown by a following formula (1), wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R2 represents a methylene group, an ethylene group, a 1-methylethylene group, a 2-methylethylene group, a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, or a derivative thereof, each of R3 represents at least one of a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, a derivative thereof, and a linear or branched alkyl group having 1 to 4 carbon atoms, provided that two of R3 may bond to form a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof together with the carbon atom that is bonded thereto, and X represents a linear or branched fluoroalkylene group having 1 to 20 carbon atoms.
摘要翻译： 化合物由下式（1）表示，其中R1表示氢原子，甲基或三氟甲基，R2表示亚甲基，亚乙基，1-甲基亚乙基，2-甲基亚乙基， 碳原子数4〜20的二价脂环式烃基或其衍生物，各R3表示碳原子数为4〜20的一价脂环族烃基，其衍生物和具有1个碳原子的直链或支链烷基中的至少一种 至4个碳原子，条件是R3中的两个可以键合形成具有4至20个碳原子的二价脂环族烃基或其衍生物和与其键合的碳原子，并且X表示具有1个碳原子的直链或支链氟亚烷基 至20个碳原子。
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