发明申请
- 专利标题： PREPARATION METHOD FOR REDUCED GRAPHENE OXIDE USING SULFONYL HYDRAZIDE-BASED REDUCING AGENT AND OPTOELECTRONIC DEVICES THEREOF
- 专利标题（中）： 使用基于硫代氢化物的还原剂及其光电装置减少氧化亚铁的制备方法
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申请号： US13356965申请日： 2012-01-24
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公开(公告)号： US20120190139A1公开(公告)日： 2012-07-26
- 发明人: Seok In NA , Dong Yu KIM , Hye Young KOO , Jin Mun YUN , Jun Seok YEO , Jun Kyung KIM
- 申请人： Seok In NA , Dong Yu KIM , Hye Young KOO , Jin Mun YUN , Jun Seok YEO , Jun Kyung KIM
- 申请人地址： KR Seoul
- 专利权人： KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
- 当前专利权人： KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
- 当前专利权人地址： KR Seoul
- 优先权： KR10-2011-0007470 20110125
- 主分类号： H01L51/56
- IPC分类号： H01L51/56 ; C01B31/02 ; H01L51/48 ; B82Y30/00 ; B82Y40/00
摘要：
A method for fabricating a graphene thin film by reducing graphene oxide and a method for fabricating an optoelectronic device using the same are provided. The method for fabricating a graphene thin film comprises: (a) preparing graphene oxide; (b) preparing graphene through reducing the graphene oxide by a sulfonyl hydrazide-based reducing agent; (c) preparing a graphene dispersed solution by dispersing the graphene into an organic solvent; and (d) fabricating a graphene thin film by applying the graphene dispersed solution. The sulfonyl hydrazide-based reducing agent may be a compound having a sulfonyl hydrazide substituent of Chemical Formula 1 in the present disclosure in which A may be any one in Chemical Formula 2 in the present disclosure.
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