发明申请
- 专利标题: NANO-IMPRINT MOLD AND SUBSTRATE WITH UNEVEN PATTERNS MANUFACTURED BY USING THE MOLD
- 专利标题(中): 使用模具制造的未加工图案的纳米印模和基材
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申请号: US13422897申请日: 2012-03-16
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公开(公告)号: US20120196084A1公开(公告)日: 2012-08-02
- 发明人: Yuichi OHSAWA , Junichi Ito , Tomotaka Ariga , Yoshinari Kurosaki , Saori Kashiwada
- 申请人: Yuichi OHSAWA , Junichi Ito , Tomotaka Ariga , Yoshinari Kurosaki , Saori Kashiwada
- 申请人地址: JP Minato-ku
- 专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人地址: JP Minato-ku
- 主分类号: B29C59/02
- IPC分类号: B29C59/02 ; B32B3/10 ; B82Y40/00
摘要:
According to one embodiment, a nano-imprint mold includes plural pairs of first and second protrusions formed on a base layer, each of which is formed along the same straight line. Each protrusion has a top surface and four side surfaces. The first and second protrusions are mirror-symmetrical with each other. A first side surface of the first protrusion and a second side surface of the second protrusion face each other. A first angle between the first side surface or the second side surface and a main surface of the base layer is not less than 85° and not more than 90°. A second angle between a third side surface in the first protrusion or a fourth side surface in the second protrusion and the main surface of the base layer is not less than 70° and not more than 88°. The first angle is larger than the second angle.
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