Invention Application
US20120199981A1 SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SEMICONDUCTOR DEVICE
审中-公开
半导体器件和半导体器件的制造方法
- Patent Title: SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SEMICONDUCTOR DEVICE
- Patent Title (中): 半导体器件和半导体器件的制造方法
-
Application No.: US13364678Application Date: 2012-02-02
-
Publication No.: US20120199981A1Publication Date: 2012-08-09
- Inventor: Se-young Jeong , Ho-geon Song , Ju-il Choi , Jae-hyun Phee
- Applicant: Se-young Jeong , Ho-geon Song , Ju-il Choi , Jae-hyun Phee
- Priority: KR10-2011-0011613 20110209
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L21/50

Abstract:
A semiconductor device includes a first device including a first substrate and a first external connection terminal for connecting outside the first device; a second device stacked on the first device, the second device including a second substrate and a second external connection terminal for connecting outside the second device; an adhesive pattern disposed between the first device and second device, the adhesive pattern disposed in locations other than locations where the first external connection terminal and second external connection terminal are disposed, and the adhesive pattern causing the first device and second device, when stacked, to be spaced apart by a predetermined distance; and a plated layer disposed between and electrically and physically connecting the first external connection terminal and the second external connection terminal.
Information query
IPC分类: