发明申请
- 专利标题: OXYGEN DIFFUSION EVALUATION METHOD OF OXIDE FILM STACKED BODY
- 专利标题(中): 氧化物膜堆积体的氧气扩散评估方法
-
申请号: US13213458申请日: 2011-08-19
-
公开(公告)号: US20120214259A1公开(公告)日: 2012-08-23
- 发明人: Yutaka Okazaki , Keitaro Imai , Atsuo Isobe , Shunpei Yamazaki
- 申请人: Yutaka Okazaki , Keitaro Imai , Atsuo Isobe , Shunpei Yamazaki
- 申请人地址: JP Atsugi
- 专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址: JP Atsugi
- 优先权: JP2010-190577 20100827
- 主分类号: H01L21/66
- IPC分类号: H01L21/66
摘要:
Experience shows that, in a material containing oxygen as a main component, an excess or deficiency of trace amounts of oxygen with respect to a stoichiometric composition, or the like affects properties of the material. An oxygen diffusion evaluation method of an oxide film stacked body includes the steps of: measuring a quantitative value of one of oxygen isotopes of a substrate including a first oxide film and a second oxide film which has an existence proportion of an oxygen isotope different from an existence proportion of an oxygen isotope in the first oxide film in a depth direction, by secondary ion mass spectrometry; and evaluating the one of the oxygen isotopes diffused from the first oxide film to the second oxide film.
公开/授权文献
信息查询
IPC分类: