- 专利标题: MODIFIED NAPHTHALENE FORMALDEHYDE RESIN, TRICYCLODECANE SKELETON-CONTAINING NAPHTHOL COMPOUND AND ESTER COMPOUND
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申请号: US13423962申请日: 2012-03-19
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公开(公告)号: US20120238781A1公开(公告)日: 2012-09-20
- 发明人: Seiji Kita , Masashi Ogiwara , Mitsuharu Kitamura , Dai Oguro , Gou Higashihara
- 申请人: Seiji Kita , Masashi Ogiwara , Mitsuharu Kitamura , Dai Oguro , Gou Higashihara
- 申请人地址: JP Tokyo
- 专利权人: Mitsubishi Gas Chemical Company, Inc.
- 当前专利权人: Mitsubishi Gas Chemical Company, Inc.
- 当前专利权人地址: JP Tokyo
- 优先权: JP2007-317102 20071207; JP2007-318874 20071210
- 主分类号: C07C49/83
- IPC分类号: C07C49/83 ; C07C45/42
摘要:
A modified dimethylnaphthalene formaldehyde resin obtained by modifying a polyfunctional dimethylnaphthalene formaldehyde resin having a constituent unit represented by the following general formula [1] in a molecule thereof with at least one member selected from the group consisting of a phenol represented by the following general formula [2], a naphthol represented by the following general formula [3] and a naphthol represented by the following general formula [4] provided that at least any of the naphthol represented by the general formula [3] or the naphthol represented by the general formula [4] must be included.
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