Invention Application
US20120244472A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, FILM FORMED USING THE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
有权
化学敏感性或辐射敏感性树脂组合物，使用组合物形成的膜和使用其的图案形成方法
- Patent Title: ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, FILM FORMED USING THE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Patent Title (中): 化学敏感性或辐射敏感性树脂组合物，使用组合物形成的膜和使用其的图案形成方法
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Application No.: US13512633Application Date: 2010-11-30
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Publication No.: US20120244472A1Publication Date: 2012-09-27
- Inventor: Tomotaka Tsuchimura , Takayuki Ito , Toru Fujimori , Kana Fujii
- Applicant: Tomotaka Tsuchimura , Takayuki Ito , Toru Fujimori , Kana Fujii
- Applicant Address: JP Minato-Ku, Tokyo
- Assignee: FUJIFILM CORPORATION
- Current Assignee: FUJIFILM CORPORATION
- Current Assignee Address: JP Minato-Ku, Tokyo
- Priority: JP2009-272353 20091130
- International Application: PCT/JP2010/071782 WO 20101130
- Main IPC: G03F7/027
- IPC: G03F7/027 ; G03F7/20
Abstract:
Provided is an actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a specific compound represented by a general formula, (B) a resin which is alkali-insoluble or sparingly alkali-soluble and becomes easily alkali-soluble in the presence of an acid, and (C) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; a film formed using the composition; and a pattern forming method using the same.
Public/Granted literature
Information query
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