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1.发明授权Actinic ray-sensitive or radiation-sensitive resin composition, film formed using the composition and pattern forming method using the same 有权光化射线敏感或辐射敏感性树脂组合物，使用其组合物和图案形成方法形成的膜公开(公告)号：US08741542B2
公开(公告)日：2014-06-03
申请号：US13512633
申请日：2010-11-30
申请人： Tomotaka Tsuchimura , Takayuki Ito , Toru Fujimori , Kana Fujii
发明人： Tomotaka Tsuchimura , Takayuki Ito , Toru Fujimori , Kana Fujii
CPC分类号： G03F7/0045 , C09B69/101 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/091
摘要： Provided is an actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a specific compound represented by a general formula, (B) a resin which is alkali-insoluble or sparingly alkali-soluble and becomes easily alkali-soluble in the presence of an acid, and (C) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; a film formed using the composition; and a pattern forming method using the same.
摘要翻译： 本发明提供一种光化射线敏感性或辐射敏感性树脂组合物，其包含（A）由通式表示的特定化合物，（B）在碱存在下碱不溶性或微溶碱性并易于碱溶解的树脂 的酸，和（C）能够在用光化射线或辐射照射时能够产生酸的化合物; 使用该组合物形成的膜; 以及使用该图案形成方法的图案形成方法。
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2.发明申请ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, FILM FORMED USING THE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME 有权化学敏感性或辐射敏感性树脂组合物，使用组合物形成的膜和使用其的图案形成方法公开(公告)号：US20120244472A1
公开(公告)日：2012-09-27
申请号：US13512633
申请日：2010-11-30
申请人： Tomotaka Tsuchimura , Takayuki Ito , Toru Fujimori , Kana Fujii
发明人： Tomotaka Tsuchimura , Takayuki Ito , Toru Fujimori , Kana Fujii
CPC分类号： G03F7/0045 , C09B69/101 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/091
摘要： Provided is an actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a specific compound represented by a general formula, (B) a resin which is alkali-insoluble or sparingly alkali-soluble and becomes easily alkali-soluble in the presence of an acid, and (C) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; a film formed using the composition; and a pattern forming method using the same.
摘要翻译： 本发明提供一种光化射线敏感性或辐射敏感性树脂组合物，其包含（A）由通式表示的特定化合物，（B）在碱存在下碱不溶性或微溶碱性并易于碱溶解的树脂 的酸，和（C）能够在用光化射线或辐射照射时能够产生酸的化合物; 使用该组合物形成的膜; 以及使用该图案形成方法的图案形成方法。
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3.发明授权Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the same 有权光化学射线或辐射敏感性树脂组合物及其形成方法公开(公告)号：US08642245B2
公开(公告)日：2014-02-04
申请号：US13421684
申请日：2012-03-15
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0397 , G03F7/2041 , G03F7/30 , Y10S430/106 , Y10S430/111 , Y10S430/12
摘要： According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin that is decomposed when acted on by an acid to thereby increase its solubility in an alkali developer, a compound that generates an acid when exposed to actinic rays or radiation, and any of basic compounds of general formula (1) below.
摘要翻译： 根据一个实施方案，光化射线或辐射敏感性树脂组合物包括当被酸作用时分解的树脂，从而增加其在碱性显影剂中的溶解度，当暴露于光化射线时产生酸的化合物或 辐射和下述通式（1）的任何碱性化合物。
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4.发明申请PHOTOSENSITIVE RESIN COMPOSITION, LIGHT-SHIELDING COLOR FILTER AND PRODUCTION PROCESS THEREFOR, AND IMAGE SENSOR 有权光敏树脂组合物，遮光颜料过滤器及其生产工艺及图像传感器公开(公告)号：US20090246651A1
公开(公告)日：2009-10-01
申请号：US12411457
申请日：2009-03-26
申请人： Toru Fujimori , Yoichi Maruyama , Hiroyuki Einaga , Kazuto Shimada , Tomotaka Tsuchimura , Yushi Kaneko
发明人： Toru Fujimori , Yoichi Maruyama , Hiroyuki Einaga , Kazuto Shimada , Tomotaka Tsuchimura , Yushi Kaneko
CPC分类号： G03F7/0007 , G03F7/031
摘要： A photosensitive resin composition is provided that includes at least (A) titanium black, (B) a polymerizable compound, (C) a photopolymerization initiator (D) a resin, and (E) an organic solvent, the photopolymerization initiator (C) using in combination two or more types of photopolymerization initiators including at least one type of oxime-based photopolymerization initiator. There are also provided a light-shielding color filter having a pattern formed by using the photosensitive resin composition, a process for producing a light-shielding color filter that includes a step of coating a substrate with the photosensitive resin composition, a step of imagewise exposing, and a step of developing to form a pattern, and an image sensor having the light-shielding color filter.
摘要翻译： 提供至少包含（A）钛黑，（B）可聚合化合物，（C）光聚合引发剂（D）和树脂）和（E）有机溶剂的光敏树脂组合物，所述光聚合引发剂（C）使用 组合两种或更多种类型的光聚合引发剂，其包括至少一种类型的肟基光聚合引发剂。 还提供了一种具有通过使用感光性树脂组合物形成的图案的遮光滤色器，制造遮光滤色器的方法，该遮光滤色器包括用感光性树脂组合物涂布基板的步骤，成像曝光步骤 ，以及形成图案的步骤，以及具有遮光滤色器的图像传感器。
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5.发明授权Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor 有权光敏树脂组合物，遮光滤色片及其制作方法及图像传感器公开(公告)号：US08110324B2
公开(公告)日：2012-02-07
申请号：US12407935
申请日：2009-03-20
申请人： Toru Fujimori , Yoichi Maruyama , Hiroyuki Einaga , Kazuto Shimada , Tomotaka Tsuchimura , Yushi Kaneko
发明人： Toru Fujimori , Yoichi Maruyama , Hiroyuki Einaga , Kazuto Shimada , Tomotaka Tsuchimura , Yushi Kaneko
IPC分类号： G02B5/20
CPC分类号： G03F7/0007
摘要： A photosensitive resin composition is provided that includes at least (A) titanium black, (B) two or more types of polymerizable compounds, (C) a resin, (D) a photopolymerization initiator, and (E) an organic solvent. There are also provided a light-shielding color filter formed by using the photosensitive resin composition, and a process for producing a light-shielding color filter, the process including a step of coating a substrate with the photosensitive resin composition, a step of imagewise exposing, and a step of developing to form a pattern. Furthermore, there is provided an image sensor that includes the light-shielding color filter.
摘要翻译： 提供至少包含（A）钛黑，（B）两种或更多种可聚合化合物，（C）树脂，（D）光聚合引发剂和（E）有机溶剂）的感光性树脂组合物。 还提供了使用感光性树脂组合物形成的遮光性滤色器，以及遮光性滤色片的制造方法，其特征在于，包括使用所述感光性树脂组合物涂布基材的工序，成像曝光工序 ，以及形成图案的步骤。 此外，提供了包括遮光滤色器的图像传感器。
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6.发明授权Polymerizable composition, light-blocking color filter for solid-state imaging device, and solid-state imaging device 有权可聚合组合物，固态成像装置的阻光滤色器和固态成像装置公开(公告)号：US08735026B2
公开(公告)日：2014-05-27
申请号：US12935789
申请日：2009-02-17
申请人： Kazuto Shimada , Tomotaka Tsuchimura , Yoichi Maruyama , Toru Fujimori , Yushi Kaneko , Hiroyuki Einaga
发明人： Kazuto Shimada , Tomotaka Tsuchimura , Yoichi Maruyama , Toru Fujimori , Yushi Kaneko , Hiroyuki Einaga
CPC分类号： G02F1/133512 , G03F7/0007 , G03F7/032 , G03F7/035 , G03F7/0388 , G03F7/105
摘要： A polymerizable composition including at least a polymerizable compound, a binder polymer, a photopolymerization initiator, and a titanium black dispersion, wherein the mass ratio of the content of the polymerizable compound to the content of the binder polymer is more than 1.
摘要翻译： 至少包含可聚合化合物，粘合剂聚合物，光聚合引发剂和钛黑分散体的可聚合组合物，其中可聚合化合物的含量与粘合剂聚合物的含量的质量比大于1。
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7.发明授权Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor 有权光敏树脂组合物，遮光滤色片及其制作方法及图像传感器公开(公告)号：US08119311B2
公开(公告)日：2012-02-21
申请号：US12411457
申请日：2009-03-26
申请人： Toru Fujimori , Yoichi Maruyama , Hiroyuki Einaga , Kazuto Shimada , Tomotaka Tsuchimura , Yushi Kaneko
发明人： Toru Fujimori , Yoichi Maruyama , Hiroyuki Einaga , Kazuto Shimada , Tomotaka Tsuchimura , Yushi Kaneko
IPC分类号： G02B5/20
CPC分类号： G03F7/0007 , G03F7/031
摘要： A photosensitive resin composition is provided that includes at least (A) titanium black, (B) a polymerizable compound, (C) a photopolymerization initiator (D) a resin, and (E) an organic solvent, the photopolymerization initiator (C) using in combination two or more types of photopolymerization initiators including at least one type of oxime-based photopolymerization initiator. There are also provided a light-shielding color filter having a pattern formed by using the photosensitive resin composition, a process for producing a light-shielding color filter that includes a step of coating a substrate with the photosensitive resin composition, a step of imagewise exposing, and a step of developing to form a pattern, and an image sensor having the light-shielding color filter.
摘要翻译： 提供至少包含（A）钛黑，（B）可聚合化合物，（C）光聚合引发剂（D）和树脂）和（E）有机溶剂的光敏树脂组合物，所述光聚合引发剂（C）使用 组合两种或更多种类型的光聚合引发剂，其包括至少一种类型的肟基光聚合引发剂。 还提供了一种具有通过使用感光性树脂组合物形成的图案的遮光滤色器，制造遮光滤色器的方法，该遮光滤色器包括用感光性树脂组合物涂布基板的步骤，成像曝光步骤 ，以及形成图案的步骤，以及具有遮光滤色器的图像传感器。
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8.发明授权Solid-state image sensor including a light-shielding color filter formed from a photosensitive resin composition, photosensitive resin composition and method of producing a light-shielding color filter 有权包括由感光性树脂组合物形成的遮光滤色器的固态图像传感器，感光性树脂组合物和遮光性滤色片的制造方法公开(公告)号：US08872099B2
公开(公告)日：2014-10-28
申请号：US12401632
申请日：2009-03-11
申请人： Yoichi Maruyama , Hiroyuki Einaga , Toru Fujimori , Kazuto Shimada , Tomotaka Tsuchimura , Yushi Kaneko
发明人： Yoichi Maruyama , Hiroyuki Einaga , Toru Fujimori , Kazuto Shimada , Tomotaka Tsuchimura , Yushi Kaneko
IPC分类号： H01J40/14 , G01J3/50 , H01J5/16 , G03F7/105 , G03F7/004 , G03F7/00 , G03F7/029 , G03F7/031 , G03F7/032 , G03F7/038 , C08F2/50
CPC分类号： G03F7/105 , C08F2/50 , G03F7/0007 , G03F7/004 , G03F7/029 , G03F7/0295 , G03F7/031 , G03F7/032 , G03F7/0388
摘要： The invention provides a photosensitive resin composition including a black colorant, a photopolymerizable compound, a resin, a photopolymerization initiator and a solvent, the composition capable of forming a light-shielding color filter having a ratio OD1200/OD365 of from 0.5 to 3, where OD1200 is an optical density at a wavelength of 1200 nm and OD365 is an optical density at a wavelength of 365 nm; and a photosensitive resin composition including titanium black, a photopolymerizable compound, a resin A having an acid value of from 70 to 250 mgKOH/g, a resin B having an acid value of from 26 to 65 mgKOH/g, a photopolymerization initiator, and a solvent.
摘要翻译： 本发明提供一种包含黑色着色剂，光聚合性化合物，树脂，光聚合引发剂和溶剂的感光性树脂组合物，其能够形成比例OD1200 / OD365为0.5〜3的遮光性滤色片，其中， OD1200是波长1200nm的光密度，OD365是波长365nm的光密度; 以及含有钛黑，光聚合性化合物，酸值为70〜250mgKOH / g的树脂A，酸值为26〜65mgKOH / g的树脂B，光聚合引发剂和 溶剂。
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9.发明申请POLYMERIZABLE COMPOSITION, LIGHT-BLOCKING COLOR FILTER FOR SOLID-STATE IMAGING DEVICE, AND SOLID-STATE IMAGING DEVICE 有权可聚合组合物，用于固态成像装置的遮光颜色过滤器和固体状态成像装置公开(公告)号：US20110104596A1
公开(公告)日：2011-05-05
申请号：US12935789
申请日：2009-02-17
申请人： Kazuto Shimada , Tomotaka Tsuchimura , Yoichi Maruyama , Toru Fujimori , Yushi Kaneko , Hiroyuki Einaga
发明人： Kazuto Shimada , Tomotaka Tsuchimura , Yoichi Maruyama , Toru Fujimori , Yushi Kaneko , Hiroyuki Einaga
CPC分类号： G02F1/133512 , G03F7/0007 , G03F7/032 , G03F7/035 , G03F7/0388 , G03F7/105
摘要： A polymerizable composition including at least a polymerizable compound, a binder polymer, a photopolymerization initiator, and a titanium black dispersion, wherein the mass ratio of the content of the polymerizable compound to the content of the binder polymer is more than 1.
摘要翻译： 至少包含可聚合化合物，粘合剂聚合物，光聚合引发剂和钛黑分散体的可聚合组合物，其中可聚合化合物的含量与粘合剂聚合物的含量的质量比大于1。
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10.发明授权Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same 有权光化射线敏感性或辐射敏感性树脂组合物和使用其的图案形成方法公开(公告)号：US08877423B2
公开(公告)日：2014-11-04
申请号：US13378387
申请日：2010-06-30
申请人： Kana Fujii , Toru Fujimori
发明人： Kana Fujii , Toru Fujimori
CPC分类号： G03F7/0048 , C08F8/02 , C08F12/22 , C08F12/24 , C08F12/32 , C08F212/14 , C09D125/14 , C09D125/18 , G03F7/0397 , C08F220/10 , C08F2220/1841
摘要： An actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin that contains a repeating unit represented by formula (I) as defined in the specification, a repeating unit represented by formula (II) as defined in the specification and a repeating unit represented by formula (III-a) or (III-b) as defined in the specification; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a solvent, wherein the solvent (C) contains ethyl lactate, and a film and a pattern forming method using the composition are provided.
摘要翻译： 一种光化射线敏感性或辐射敏感性树脂组合物，其包含：（A）含有本说明书中定义的式（I）表示的重复单元的树脂，由说明书中定义的式（II）表示的重复单元和 由本说明书中定义的式（III-a）或（III-b）表示的重复单元; （B）能够在用光化射线或辐射照射时能产生酸的化合物; 和（C）溶剂，其中溶剂（C）含有乳酸乙酯，并且提供使用该组合物的膜和图案形成方法。
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