发明申请
- 专利标题: BONDING METHOD, BONDING APPARATUS, AND BONDING SYSTEM
- 专利标题(中): 接合方法,接合装置和接合系统
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申请号: US13504356申请日: 2010-11-30
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公开(公告)号: US20120247645A1公开(公告)日: 2012-10-04
- 发明人: Keiichiro Tsutsumi , Takeshi Tsuno , Takayuki Goto , Masato Kinouchi , Takenori Suzuki , Kensuke Ide
- 申请人: Keiichiro Tsutsumi , Takeshi Tsuno , Takayuki Goto , Masato Kinouchi , Takenori Suzuki , Kensuke Ide
- 申请人地址: JP Tokyo
- 专利权人: MITSUBISHI HEAVY INDUSTIRIES, LTD.
- 当前专利权人: MITSUBISHI HEAVY INDUSTIRIES, LTD.
- 当前专利权人地址: JP Tokyo
- 优先权: JP2009-271465 20091130
- 国际申请: PCT/JP2010/006965 WO 20101130
- 主分类号: B32B41/00
- IPC分类号: B32B41/00 ; B32B37/08 ; B32B37/06
摘要:
The present invention includes an activating step S2 of activating, by irradiating a first substrate surface of a first substrate and a second substrate surface of a second substrate with particles, the second substrate surface and the first substrate surface, and a bonding step S4 of bonding the second substrate and the first substrate together by bringing the second substrate surface and the first substrate surface into contact with each other after a temperature difference between a temperature of the first substrate and a temperature of the second substrate becomes equal to or lower than a predetermined value. According to this bonding method, warpage occurring in a bonded substrate obtained can be further reduced compared with other bonding methods of bonding both substrates before the temperature difference between the temperature of the first substrate and the temperature of the second substrate becomes equal to or lower than a predetermined value.
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