Invention Application
- Patent Title: ELECTRON BEAM SOURCE AND METHOD OF MANUFACTURING THE SAME
- Patent Title (中): 电子束源及其制造方法
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Application No.: US13075325Application Date: 2011-03-30
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Publication No.: US20120248959A1Publication Date: 2012-10-04
- Inventor: Wolfram Buehler , Volker Drexel
- Applicant: Wolfram Buehler , Volker Drexel
- Applicant Address: DE Oberkochen
- Assignee: CARL ZEISS NTS GMBH
- Current Assignee: CARL ZEISS NTS GMBH
- Current Assignee Address: DE Oberkochen
- Main IPC: H01J61/52
- IPC: H01J61/52 ; H01J29/64 ; H01J29/46
Abstract:
An electron beam source includes a base and a tip fixed to the base and extending from the base. The tip includes a core and a coating applied to the core. The core has a surface that includes a first material. The coating includes a second material which is different from the first material. The second material forms a surface of the tip, and the second coating includes more than 30% by weight of a lanthanide element.
Public/Granted literature
- US08536773B2 Electron beam source and method of manufacturing the same Public/Granted day:2013-09-17
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