发明申请
US20120251723A1 METHOD OF CLEANING FILM FORMING APPARATUS, FILM FORMING METHOD, AND FILM FORMING APPARATUS
审中-公开
清洁膜成型装置，成膜方法和成膜装置的方法
- 专利标题： METHOD OF CLEANING FILM FORMING APPARATUS, FILM FORMING METHOD, AND FILM FORMING APPARATUS
- 专利标题（中）： 清洁膜成型装置，成膜方法和成膜装置的方法
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申请号： US13514851申请日： 2010-12-08
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公开(公告)号： US20120251723A1公开(公告)日： 2012-10-04
- 发明人: Katsushi Kishimoto , Kazuhiko Isshiki
- 申请人： Katsushi Kishimoto , Kazuhiko Isshiki
- 优先权： JP2009-281328 20091211
- 国际申请： PCT/JP2010/071995 WO 20101208
- 主分类号： B08B7/00
- IPC分类号： B08B7/00 ; C23C16/22 ; C23C16/503
摘要：
Plasma is generated on the first condition between a cathode electrode and an anode electrode. Then, plasma is generated on the second condition different from the first condition. The second condition is for spreading plasma between the cathode electrode and the anode electrode in the outer peripheral direction as compared with the first condition. Accordingly, in addition to a deposit on the electrode, a deposit on the member provided in the vicinity of the outer periphery of the electrode can be immediately removed.
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