METHOD OF CLEANING FILM FORMING APPARATUS, FILM FORMING METHOD, AND FILM FORMING APPARATUS
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    发明申请
    METHOD OF CLEANING FILM FORMING APPARATUS, FILM FORMING METHOD, AND FILM FORMING APPARATUS 审中-公开
    清洁膜成型装置,成膜方法和成膜装置的方法

    公开(公告)号:US20120251723A1

    公开(公告)日:2012-10-04

    申请号:US13514851

    申请日:2010-12-08

    IPC分类号: B08B7/00 C23C16/22 C23C16/503

    CPC分类号: C23C16/4405 B08B7/0035

    摘要: Plasma is generated on the first condition between a cathode electrode and an anode electrode. Then, plasma is generated on the second condition different from the first condition. The second condition is for spreading plasma between the cathode electrode and the anode electrode in the outer peripheral direction as compared with the first condition. Accordingly, in addition to a deposit on the electrode, a deposit on the member provided in the vicinity of the outer periphery of the electrode can be immediately removed.

    摘要翻译: 在阴极电极和阳极电极之间的第一状态下产生等离子体。 然后,在与第一条件不同的第二条件下产生等离子体。 第二个条件是与第一条件相比,在外周方向上在等离子体之间扩散阴极电极和阳极电极。 因此,除了电极上的沉积之外,可以立即除去设置在电极外周附近的部件上的沉积物。