发明申请
- 专利标题: SUBSTRATE TRANSFER METHOD FOR PERFORMING PROCESSES INCLUDING PHOTOLITHOGRAPHY SEQUENCE
- 专利标题(中): 用于执行包括光刻机序列的处理的基板传输方法
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申请号: US13495611申请日: 2012-06-13
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公开(公告)号: US20120251957A1公开(公告)日: 2012-10-04
- 发明人: Yuichi Yamamoto , Tadayuki Yamaguchi , Yasuhito Saiga , Yoshiaki Yamada
- 申请人: Yuichi Yamamoto , Tadayuki Yamaguchi , Yasuhito Saiga , Yoshiaki Yamada
- 申请人地址: JP Minato-ku
- 专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人地址: JP Minato-ku
- 优先权: JP2006-165620 20060615
- 主分类号: H01L21/677
- IPC分类号: H01L21/677 ; G03F7/20
摘要:
A substrate transfer method for transferring target substrates proceeds in a substrate processing system for performing processes including a photolithography sequence on the target substrates. The system includes a first automated substrate transfer line configured to transfer the target substrates among a plurality of process sections for respectively performing processes on the target substrates, and a second automated substrate transfer line of a cyclical type dedicated to a plurality of process apparatuses of a photolithography process section, which are configured to perform a series of processes in the photolithography sequence, the second automated substrate transfer line being located relative to the first automated substrate transfer line so as for the target substrates to be transferred therebetween. The method includes, in order to proceed with the photolithography sequence, transferring the target substrates among the process apparatuses in the photolithography process section by use of the second automated substrate transfer line.