发明申请
- 专利标题： PROCESSING CHAMBER WITH COOLED GAS DELIVERY LINE
- 专利标题（中）： 具有冷却气体输送管线的加工室
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申请号： US13462939申请日： 2012-05-03
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公开(公告)号： US20120279943A1公开(公告)日： 2012-11-08
- 发明人: Helinda Nominanda , Tae Kyung Won , Seon-Mee Cho , Beom Soo Park , Soo Young Choi
- 申请人： Helinda Nominanda , Tae Kyung Won , Seon-Mee Cho , Beom Soo Park , Soo Young Choi
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 主分类号： C23C16/50
- IPC分类号： C23C16/50 ; B05C9/00 ; B44C1/22 ; C23C16/511
摘要：
A method and apparatus for processing a substrate is provided. In one embodiment, the apparatus is in the form of a processing chamber that includes a chamber body having a processing volume defined therein. A substrate support, a gas delivery tube assembly and a plasma line source are disposed in the processing volume. The gas delivery tube assembly includes an inner tube is disposed in an outer tube. The inner tube has a passage for flowing a cooling fluid therein. The outer tube has a plurality of gas distribution apertures for providing processing gas into the processing volume.
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