发明申请
US20120292641A1 SEMICONDUCTOR DEVICE HAVING AT LEAST ONE CONTACT, AND MANUFACTURING METHOD FOR A SEMICONDUCTOR DEVICE HAVING AT LEAST ONE CONTACT
有权
具有至少一个接触件的半导体器件以及具有至少一个接触件的半导体器件的制造方法
- 专利标题： SEMICONDUCTOR DEVICE HAVING AT LEAST ONE CONTACT, AND MANUFACTURING METHOD FOR A SEMICONDUCTOR DEVICE HAVING AT LEAST ONE CONTACT
- 专利标题（中）： 具有至少一个接触件的半导体器件以及具有至少一个接触件的半导体器件的制造方法
-
申请号： US13446531申请日： 2012-04-13
-
公开(公告)号： US20120292641A1公开(公告)日： 2012-11-22
- 发明人: Frederik Schrey , Achim Trautmann , Joachim Rudhard
- 申请人： Frederik Schrey , Achim Trautmann , Joachim Rudhard
- 优先权： DE102011075888.7 20110516
- 主分类号： H01L29/161
- IPC分类号： H01L29/161 ; H01L21/28
摘要：
A semiconductor device having a substrate, and at least one contact, situated on and/or above a surface of the substrate, having at least one layer made of a conductive material, the conductive material including at least one metal. The layer made of the conductive material is sputtered on, and has tear-off marks on at least one outer side area between an outer base area facing the surface and an outer contact area facing away from the surface. A manufacturing method for a semiconductor device having at least one contact is also described.
公开/授权文献
信息查询
IPC分类:
