Invention Application
US20120301677A1 METHOD OF FORMING ORIENTED BLOCK COPOLYMER LINE PATTERNS, BLOCK COPOLYMER LINE PATTERNS FORMED THEREBY, AND THEIR USE TO FORM PATTERNED ARTICLES
有权
形成面向嵌段共聚物线图案的方法，其形成的嵌段共聚物线图案及其用于形成图案的文章
- Patent Title: METHOD OF FORMING ORIENTED BLOCK COPOLYMER LINE PATTERNS, BLOCK COPOLYMER LINE PATTERNS FORMED THEREBY, AND THEIR USE TO FORM PATTERNED ARTICLES
- Patent Title (中): 形成面向嵌段共聚物线图案的方法，其形成的嵌段共聚物线图案及其用于形成图案的文章
-
Application No.: US13480506Application Date: 2012-05-25
-
Publication No.: US20120301677A1Publication Date: 2012-11-29
- Inventor: Thomas P. Russell , Sung Woo Hong , Doug Hyun Lee , Soojin Park , Ting Xu
- Applicant: Thomas P. Russell , Sung Woo Hong , Doug Hyun Lee , Soojin Park , Ting Xu
- Main IPC: B32B3/30
- IPC: B32B3/30 ; B05D3/02
Abstract:
A block copolymer film having a line pattern with a high degree of long-range order is formed by a method that includes forming a block copolymer film on a substrate surface with parallel facets, and annealing the block copolymer film to form an annealed block copolymer film having linear microdomains parallel to the substrate surface and orthogonal to the parallel facets of the substrate. The line-patterned block copolymer films are useful for the fabrication of magnetic storage media, polarizing devices, and arrays of nanowires.
Public/Granted literature
Information query
