SELF-ASSEMBLY OF BLOCK COPOLYMERS ON TOPOGRAPHICALLY PATTERNED POLYMERIC SUBSTRATES
    1.
    发明申请
    SELF-ASSEMBLY OF BLOCK COPOLYMERS ON TOPOGRAPHICALLY PATTERNED POLYMERIC SUBSTRATES 有权
    嵌入式聚合物基板上的嵌段共聚物自组装

    公开(公告)号:US20120276346A1

    公开(公告)日:2012-11-01

    申请号:US13546378

    申请日:2012-07-11

    IPC分类号: B32B3/10

    摘要: Highly-ordered block copolymer films are prepared by a method that includes forming a polymeric replica of a topographically patterned crystalline surface, forming a block copolymer film on the topographically patterned surface of the polymeric replica, and annealing the block copolymer film. The resulting structures can be used in a variety of different applications, including the fabrication of high density data storage media. The ability to use flexible polymers to form the polymeric replica facilitates industrial-scale processes utilizing the highly-ordered block copolymer films.

    摘要翻译: 通过一种方法制备高度有序的嵌段共聚物膜,该方法包括形成地形图案化的结晶表面的聚合物复合物,在聚合物复合体的地形图形表面上形成嵌段共聚物膜,并退火嵌段共聚物膜。 所得到的结构可以用于各种不同的应用,包括制造高密度数据存储介质。 使用柔性聚合物形成聚合物复制品的能力有助于利用高阶嵌段共聚物膜的工业规模工艺。

    Self-assembly of block copolymers on topographically patterned polymeric substrates
    2.
    发明授权
    Self-assembly of block copolymers on topographically patterned polymeric substrates 有权
    嵌段共聚物在地形图案聚合物基材上的自组装

    公开(公告)号:US09335629B2

    公开(公告)日:2016-05-10

    申请号:US13546378

    申请日:2012-07-11

    摘要: Highly-ordered block copolymer films are prepared by a method that includes forming a polymeric replica of a topographically patterned crystalline surface, forming a block copolymer film on the topographically patterned surface of the polymeric replica, and annealing the block copolymer film. The resulting structures can be used in a variety of different applications, including the fabrication of high density data storage media. The ability to use flexible polymers to form the polymeric replica facilitates industrial-scale processes utilizing the highly-ordered block copolymer films.

    摘要翻译: 通过一种方法制备高度有序的嵌段共聚物膜,该方法包括形成地形图案化的结晶表面的聚合物复合物,在聚合物复合体的地形图形表面上形成嵌段共聚物膜,并退火嵌段共聚物膜。 所得到的结构可以用于各种不同的应用,包括制造高密度数据存储介质。 使用柔性聚合物形成聚合物复制品的能力有助于利用高阶嵌段共聚物膜的工业规模工艺。

    METHOD OF PRODUCING NANOPATTERNED ARTICLES, AND ARTICLES PRODUCED THEREBY
    10.
    发明申请
    METHOD OF PRODUCING NANOPATTERNED ARTICLES, AND ARTICLES PRODUCED THEREBY 有权
    生产纳米级物品的方法和生产的物品

    公开(公告)号:US20100086801A1

    公开(公告)日:2010-04-08

    申请号:US12566705

    申请日:2009-09-25

    IPC分类号: B32B3/10 B05D5/00 B05D3/10

    摘要: Nanopatterned surfaces are prepared by a method that includes forming a block copolymer film on a substrate, annealing and surface reconstructing the block copolymer film to create an array of cylindrical voids, depositing a metal on the surface-reconstructed block copolymer film, and heating the metal-coated block copolymer film to redistribute at least some of the metal into the cylindrical voids. When very thin metal layers and low heating temperatures are used, metal nanodots can be formed. When thicker metal layers and higher heating temperatures are used, the resulting metal structure includes nanoring-shaped voids. The nanopatterned surfaces can be transferred to the underlying substrates via etching, or used to prepare nanodot- or nanoring-decorated substrate surfaces.

    摘要翻译: 纳米图案化表面通过包括在基材上形成嵌段共聚物膜,退火和表面重构嵌段共聚物膜以形成圆柱形空隙的阵列,在表面重构的嵌段共聚物膜上沉积金属和加热金属的方法制备 涂覆的嵌段共聚物膜将至少一些金属重新分布到圆柱形空隙中。 当使用非常薄的金属层和低加热温度时,可以形成金属纳米点。 当使用较厚的金属层和较高的加热温度时,所得到的金属结构包括纳米形空隙。 纳米图案的表面可以通过蚀刻转移到下面的基底,或用于制备纳米点或纳米装饰的基底表面。