Invention Application
US20120319000A1 MAGNETICALLY ENHANCED, INDUCTIVELY COUPLED PLASMA SOURCE FOR A FOCUSED ION BEAM SYSTEM
有权
用于聚焦离子束系统的磁感应加强电感耦合等离子体源
- Patent Title: MAGNETICALLY ENHANCED, INDUCTIVELY COUPLED PLASMA SOURCE FOR A FOCUSED ION BEAM SYSTEM
- Patent Title (中): 用于聚焦离子束系统的磁感应加强电感耦合等离子体源
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Application No.: US13437518Application Date: 2012-04-02
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Publication No.: US20120319000A1Publication Date: 2012-12-20
- Inventor: John Keller , Noel Smith , Roderick Boswell , Lawrence Scipioni , Christine Charles , Orson Sutherland
- Applicant: John Keller , Noel Smith , Roderick Boswell , Lawrence Scipioni , Christine Charles , Orson Sutherland
- Applicant Address: US OR HILLSBORO
- Assignee: FEI COMPANY
- Current Assignee: FEI COMPANY
- Current Assignee Address: US OR HILLSBORO
- Main IPC: G21K5/04
- IPC: G21K5/04
Abstract:
The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source.
Public/Granted literature
- US08829468B2 Magnetically enhanced, inductively coupled plasma source for a focused ion beam system Public/Granted day:2014-09-09
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