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    Method and System for Imaging a Sample
    1.
    发明申请
    Method and System for Imaging a Sample 有权

    公开(公告)号：US20250166963A1

    公开(公告)日：2025-05-22

    申请号：US18516040

    申请日：2023-11-21

    Applicant: FEI Company

    Inventor： Milos Malínský ,  Pavel Stejskal ,  Ondrej Ludmil Shanel

    IPC: H01J37/28 ,  H01J37/147 ,  H01J37/244

    Abstract: A sample is imaged by directing charged particle beam towards a sample and form an irradiation zone. The charged particle beam is scanned so that the irradiation zone is scanned in the sample plane in a first direction and the radiations from a detection zone are detected by a detector. A first number of detecting pixels arranged along a first detector axis corresponding to the first detection axis is fewer than a second number of detecting pixels arranged along a second detector axis corresponding to the second detection axis.

    DRY ELECTRON SOURCE ENVIRONMENT
    5.
    发明申请
    DRY ELECTRON SOURCE ENVIRONMENT 有权

    公开(公告)号：US20250125114A1

    公开(公告)日：2025-04-17

    申请号：US18485133

    申请日：2023-10-11

    Applicant: FEI Company

    Inventor： Alexandr DOLGOV ,  Leo VAN HELVERT

    IPC: H01J37/06 ,  H01J37/141

    Abstract: A charged particle microscope system, comprising an electron source housing a Wehnelt electrode and a cathode, wherein the electron source may include a dry environment defining a volume between the Wehnelt electrode and the cathode that may be substantially water-free, a beam column including a plurality of electromagnetic lens elements, and a vacuum chamber including a sample holder. An electron beam axis may be defined from the cathode to the sample holder.

    SAMPLE CARRIER AND USES THEREOF
    6.
    发明申请
    SAMPLE CARRIER AND USES THEREOF 有权

    公开(公告)号：US20250104962A1

    公开(公告)日：2025-03-27

    申请号：US18473035

    申请日：2023-09-22

    Applicant: FEI Company

    Inventor： Christopher Thompson ,  Hans Persoon ,  Ruud Schampers

    IPC: H01J37/28 ,  H01J37/20 ,  H01J37/22

    Abstract: A sample carrier for a charged particle microscope. The sample carrier comprises a planar or substantially planar body, an opening, and at least one protrusion. The opening is provided in the planar or substantially planar body. The protrusion extends into the opening within a plane defined by the planar or substantially planar body. The protrusion is configured to hold a charged particle microscopy sample.

    BLANKER-ENHANCED MOIRE IMAGING
    7.
    发明申请
    BLANKER-ENHANCED MOIRE IMAGING 有权

    公开(公告)号：US20250104958A1

    公开(公告)日：2025-03-27

    申请号：US18472943

    申请日：2023-09-22

    Applicant: FEI Company

    Inventor： Bert Freitag ,  Erik Kieft

    IPC: H01J37/04

    Abstract: In some embodiments, a scientific instrument includes an electron-beam column configured to scan an electron beam across a sample. The electron-beam column includes a beam blanker configured to gate the electron beam in response to a drive signal. The scientific instrument also includes an electron detector configured to measure a flux of transmitted or scattered electrons having interacted with the sample and an electronic controller configured to acquire an image of the sample using values of the flux measured with the electron detector for a plurality of electron-beam scan locations. The electronic controller is further configured to cause the drive signal to have a gating frequency at which the image has a moiré pattern therein.

    DELAYERING APPARATUS AND METHODS
    8.
    发明申请
    DELAYERING APPARATUS AND METHODS 有权

    公开(公告)号：US20250095959A1

    公开(公告)日：2025-03-20

    申请号：US18369967

    申请日：2023-09-19

    Applicant: FEI Company

    Inventor： Chad Rue ,  Lilly Landers ,  Jason Arjavac ,  Gavin Mitchson

    IPC: H01J37/305

    Abstract: Methods include conditioning at least a portion of a gas delivery system with a carbon-based conditioning agent to provide a carbon-based residual, and etching a substrate with a focused ion beam, in the presence of an ammonia-based delayering agent provided by the gas delivery system and in the presence of the carbon-based residual, wherein the carbon-based residual reduces a topographical variation of a depth of the etching. Apparatus include a focused ion beam system configured to deliver a focused ion beam to a sample, and a pre-conditioned gas delivery system configured to deliver an ammonia-based delayering agent to the sample at least while the focused ion beam is being delivered to the sample, wherein the pre-conditioned gas delivery system includes a carbon-based residual in the gas delivery system, wherein a portion of the carbon-based residual is present at the sample during the etching of the sample with the ammonia-based delayering agent.

    SHIELDED DETECTOR FOR CHARGED PARTICLE MICROSCOPY
    9.
    发明申请
    SHIELDED DETECTOR FOR CHARGED PARTICLE MICROSCOPY 有权

    公开(公告)号：US20250069844A1

    公开(公告)日：2025-02-27

    申请号：US18456048

    申请日：2023-08-25

    Applicant: FEI Company

    Inventor： Petr Hlavenka ,  Eva Štastná ,  Vojtech Mahel ,  Jakub Klus ,  Branislav Straka

    IPC: H01J37/244 ,  H01J37/28

    Abstract: Systems, components, and methods for detecting characteristic signals are described. A detector includes a detector cell. The detector cell can be configured to generate an electrical signal in response to a particle incident on an active layer of the detector cell, The active layer can define an absorption surface. The detector can include a filter. The filter can include a membrane of carbon material. The filter can be disposed relative to the detector cell to shield the absorption surface from a subset of the incident particles. The subset of the incident particles can include electrons, ions, and photons. The photons can have an energy less than about 40 eV.

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