发明申请
- 专利标题: SYSTEM AND METHOD FOR NONDESTRUCTIVELY MEASURING CONCENTRATION AND THICKNESS OF DOPED SEMICONDUCTOR LAYERS
- 专利标题(中): 用于非结构测量浓度和掺杂半导体层厚度的系统和方法
-
申请号: US13530774申请日: 2012-06-22
-
公开(公告)号: US20130003050A1公开(公告)日: 2013-01-03
- 发明人: NanChang Zhu , Derrick Shaughnessy , Houssam Chouaib , Yaolei Zheng , Lu Yu , Jianli Cui , Jin An , Jianou Shi
- 申请人: NanChang Zhu , Derrick Shaughnessy , Houssam Chouaib , Yaolei Zheng , Lu Yu , Jianli Cui , Jin An , Jianou Shi
- 申请人地址: US CA Milpitas
- 专利权人: KLA-TENCOR CORPORATION
- 当前专利权人: KLA-TENCOR CORPORATION
- 当前专利权人地址: US CA Milpitas
- 主分类号: G01B11/06
- IPC分类号: G01B11/06 ; G01N21/88 ; G01N21/47
摘要:
The disclosure is directed to nondestructive systems and methods for simultaneously measuring active carrier concentration and thickness of one or more doped semiconductor layers. Reflectance signals may be defined as functions of active carrier concentration and thickness varying over different wavelengths and over different incidence angles of analyzing illumination reflected off the surface of an analyzed sample. Systems and methods are provided for collecting a plurality of reflectance signals having either different wavelengths or different incidence angle ranges to extract active carrier density and thickness of one or more doped semiconductor layers.
公开/授权文献
信息查询