发明申请
US20130005982A1 NOVEL DIARYL SULFONE COMPOUND, AND MANUFACTURING METHOD FOR SAME
有权
新型DIARYL SULFONE化合物及其制造方法
- 专利标题: NOVEL DIARYL SULFONE COMPOUND, AND MANUFACTURING METHOD FOR SAME
- 专利标题(中): 新型DIARYL SULFONE化合物及其制造方法
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申请号: US13583730申请日: 2011-03-09
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公开(公告)号: US20130005982A1公开(公告)日: 2013-01-03
- 发明人: Paul Kuad , Hisaaki Kanda , Takeshi Fujiwara , Hiroyuki Shiraishi
- 申请人: Paul Kuad , Hisaaki Kanda , Takeshi Fujiwara , Hiroyuki Shiraishi
- 申请人地址: JP KAKO-GUN
- 专利权人: SUMITOMO SEIKA CHEMICALS CO., LTD.
- 当前专利权人: SUMITOMO SEIKA CHEMICALS CO., LTD.
- 当前专利权人地址: JP KAKO-GUN
- 优先权: JP2010-062880 20100318; JP2010-064031 20100319
- 国际申请: PCT/JP2011/055453 WO 20110309
- 主分类号: C07C323/65
- IPC分类号: C07C323/65 ; C07D277/74 ; C07C319/14
摘要:
The present invention provides a diaryl sulfone compound represented by Formula (1): wherein R1 to R4 and R1′ to R4′ are the same or different, and each represents hydrogen, C1-4 alkyl, or halogen, and R5 represents C2-6 alkenyl, C1-4 alkyl, or aromatic heterocyclic group; a method for producing the diaryl sulfone compound represented by Formula (1) by reacting a 4,4′-dihaloarylsulfone compound with thiol salt compound having an alkylene group; and a method for producing the diaryl sulfone compound represented by Formula (1) by reacting a 4,4′-dihaloarylsulfone compound with a thiol salt compound having a hydroxyl group, and subjecting the resulting compound to reaction with a halogenating agent, followed by a dehydrohalogenation reaction.
公开/授权文献
- US09365507B2 Diaryl sulfone compound, and manufacturing method for same 公开/授权日:2016-06-14
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