发明申请
- 专利标题： LIQUID PROCESS APPARATUS AND LIQUID PROCESS METHOD
- 专利标题（中）： 液体过程设备和液体过程方法
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申请号： US13546394申请日： 2012-07-11
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公开(公告)号： US20130014784A1公开(公告)日： 2013-01-17
- 发明人: Norihiro ITO , Kazuhiro AlURA , Naoki SHINDO , Yosuke HACHIYA , Takashi NAGAI
- 申请人： Norihiro ITO , Kazuhiro AlURA , Naoki SHINDO , Yosuke HACHIYA , Takashi NAGAI
- 申请人地址： JP Minato-Ku
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Minato-Ku
- 优先权： JP2011-154096 20110712; JP2011-154111 20110712
- 主分类号： B08B7/04
- IPC分类号： B08B7/04 ; B08B3/10 ; B08B3/08
摘要：
A top plate 32 is provided to be moved in a horizontal direction between an advanced position, in which the top plate 32 covers from above a substrate W held by a substrate holding unit 21, and a retracted position that is retracted from the advanced position. An air hood 70 configured to supply a purified gas downward is provided to be lifted between a lower position, in which the air hood covers from above the substrate W held by the substrate holding unit 21, and an upper position located above the lower position.
公开/授权文献
- US09177838B2 Liquid process apparatus and liquid process method 公开/授权日：2015-11-03
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