LIQUID PROCESS APPARATUS AND LIQUID PROCESS METHOD
    1.
    发明申请
    LIQUID PROCESS APPARATUS AND LIQUID PROCESS METHOD 有权
    液体过程设备和液体过程方法

    公开(公告)号:US20130014784A1

    公开(公告)日:2013-01-17

    申请号:US13546394

    申请日:2012-07-11

    IPC分类号: B08B7/04 B08B3/10 B08B3/08

    CPC分类号: H01L21/67051 G03F7/423

    摘要: A top plate 32 is provided to be moved in a horizontal direction between an advanced position, in which the top plate 32 covers from above a substrate W held by a substrate holding unit 21, and a retracted position that is retracted from the advanced position. An air hood 70 configured to supply a purified gas downward is provided to be lifted between a lower position, in which the air hood covers from above the substrate W held by the substrate holding unit 21, and an upper position located above the lower position.

    摘要翻译: 顶板32设置成在顶板32从由基板保持单元21保持的基板W上方覆盖的前进位置和从前进位置缩回的缩回位置之间沿水平方向移动。 被配置为向下供给净化气体的空气罩70被设置为在从由基板保持单元21保持的基板W的上方覆盖着空气罩的下部位置和位于下部位置上方的上部位置之间提升。