发明申请
- 专利标题: MULTI-STAGE SUBSTRATE CLEANING METHOD AND APPARATUS
- 专利标题(中): 多级基板清洗方法和装置
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申请号: US13670006申请日: 2012-11-06
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公开(公告)号: US20130068261A1公开(公告)日: 2013-03-21
- 发明人: Arnold Kholodenko , Katrina Mikhaylichenko , Cheng-Yu (Sean) Lin , Mark Wilcoxson , Leon Ginzburg , Mark Kawaguchi
- 申请人: Arnold Kholodenko , Katrina Mikhaylichenko , Cheng-Yu (Sean) Lin , Mark Wilcoxson , Leon Ginzburg , Mark Kawaguchi
- 主分类号: B08B3/04
- IPC分类号: B08B3/04
摘要:
A first application of a cleaning material is made to a surface of a substrate. The cleaning material includes one or more viscoelastic materials for entrapping contaminants present on the surface of the substrate. A first application of a rinsing fluid is made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate. The first application of the rinsing fluid is also performed to leave a residual thin film of the rinsing fluid on the surface of the substrate. A second application of the cleaning material is made to the surface of the substrate having the residual thin film of rinsing fluid present thereon. A second application of the rinsing fluid is then made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate.
公开/授权文献
- US08757177B2 Multi-stage substrate cleaning method and apparatus 公开/授权日:2014-06-24
信息查询
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